SCHEMBL6325933

SCHEMBL6325933

N#CCC(N)C#N

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14941161 0.78
SCHEMBL10931857 0.78
SCHEMBL11475890 0.74 LOX (0.32)
SCHEMBL2403021 0.74
SCHEMBL3203297 0.74
SCHEMBL6232688 0.74
SCHEMBL28715198 0.73
SCHEMBL11208490 0.71
SCHEMBL11100972 0.71
SCHEMBL2562995 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6197867-B1 DINITRILE PROCESSING AIDS THE GOODYEAR TIRE & RUBBER COMPANY 2001-03-06 US claimed
WO-2017069428-A1 ORGANIC ELECTROLUMINESCENT COMPOUNDS AND ORGANIC ELECTROLUMINESCENT DEVICE COMPRISING THE SAME ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) 2017-04-27 WO disclosed
CN-101477307-B Photomask blank, resist pattern forming process, and photomask preparation process SHIN ETSU EHEMICAL CO LTD 2012-12-12 CN disclosed
CN-101477307-A Photomask blank, resist pattern forming process, and photomask preparation process SHINETSU CHEMICAL CO (JP) 2009-07-08 CN disclosed
US-20050079446-A1 Novel polymerizable compound, polymer, positive-resist composition, and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-04-14 US disclosed
US-20050079440-A1 Novel polymer, positive resist composition, and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-04-14 US disclosed
CN-1121859-C Process for preparing pharmaceutical composition for treatment or prevention hypertension SNAKYO CO LTD (JP) 2003-09-24 CN disclosed
CN-1101384-C Process for preparing 1-biphenylmethylimidazole derivatives SANKYO CO (JP) 2003-02-12 CN disclosed
US-6197867-B1 DINITRILE PROCESSING AIDS THE GOODYEAR TIRE & RUBBER COMPANY 2001-03-06 US disclosed
EP-0965613-A1 Rubber compositions containing organo-nitriles THE GOODYEAR TIRE & RUBBER COMPANY (US) 1999-12-22 EP disclosed
CN-1045770-C Process for preparing 1-biphenylmethylimidazole derivatives SANKYO CO (JP) 1999-10-20 CN disclosed
CN-1189490-A Process for preparing 1-biphenylmethylimidazole derivatives SANKYO CO (JP) 1998-08-05 CN disclosed
CN-1188645-A Process for preparing pharmaceutical composition for treatment or prevention hypertension SNAKYO CO LTD (JP) 1998-07-29 CN disclosed
CN-1037099-C Method for the selective hydrogenation of a dinitrile compound DSM NV (NL) 1998-01-21 CN disclosed