SCHEMBL6340842

SCHEMBL6340842

COC(F)(F)C(F)(F)C(F)(F)C(F)F

nearest known ligand 0.38

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.38
TSHR P16473 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
GAA P10253 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2777442 0.82 KDM4E (0.31) KDM4ETSHRTDP1
SCHEMBL9331248 0.75 ALDH1A1 (0.33)
SCHEMBL17123476 0.75 ALDH1A1 (0.33)
Methoxymethane SCHEMBL5186167 0.74 KDM4E (0.39) KDM4ETSHRTDP1GAA
SCHEMBL29946240 0.74 KDM4E (0.35) KDM4ETSHRTDP1
SCHEMBL16343844 0.72 KDM4E (0.38) KDM4ETSHRTDP1
SCHEMBL30496175 0.72 KDM4E (0.34) KDM4ETSHRTDP1GAA
SCHEMBL525795 0.71 KDM4E (0.50) KDM4ETSHRTDP1
SCHEMBL498059 0.71 KDM4E (0.43) KDM4ETSHRTDP1
SCHEMBL22761469 0.70 KDM4E (0.37) KDM4ETSHRTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113368776-B Compound fluorine-containing solvent and application thereof 氟金(上海)新材料有限公司 2023-07-14 CN claimed
US-20240376233-A1 FLUORORESIN, MANUFACTURING METHOD THEREFOR, COMPOSITION, AND ARTICLE AGC Inc. (JP) 2024-11-14 US disclosed
EP-3342790-B1 METHOD FOR PRODUCING FLUORINE-CONTAINING POLYMER AGC INC (JP) 2023-10-04 EP disclosed
WO-2023157589-A1 FLUORORESIN, MANUFACTURING METHOD THEREFOR, COMPOSITION, AND ARTICLE AGC株式会社 2023-08-24 WO disclosed
CN-113368776-B Compound fluorine-containing solvent and application thereof 氟金(上海)新材料有限公司 2023-07-14 CN disclosed
WO-2019113406-A1 VISCOSITY REDUCTION FOR IONIC LIQUID ELECTROLYTES SILLION, INC. (US) 2019-06-13 WO disclosed
US-6939613-B2 Optical member, process of producing optical member, and process of producing thin film HOYA CORPORATION (JP) 2005-09-06 US disclosed
EP-1351071-A2 Optical member with antireflection film and water-repellent layer and production processes HOYA CORPORATION (JP) 2003-10-08 EP disclosed
US-20030181044-A1 Optical member, process of producing optical member, and process of producing thin film HOYA CORPORATION 2003-09-25 US disclosed