SCHEMBL6347486

SCHEMBL6347486

[CH2]CN(C)[C]=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6349151 0.75
SCHEMBL41939 0.69
SCHEMBL208618 0.67
SCHEMBL27620064 0.67
SCHEMBL736657 0.67
SCHEMBL514542 0.67
SCHEMBL515488 0.67
SCHEMBL9626950 0.65 ALDH1A1 (0.42)
SCHEMBL41852 0.65
SCHEMBL944401 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1276012-B1 Resist patterning process SHINETSU CHEMICAL CO (JP) 2016-03-23 EP disclosed
US-6878508-B2 Resist patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-04-12 US disclosed
US-6830866-B2 Hydrogenated product of ring- opening metathesis polymer and a poly(meth)acrylic acid derivative as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etch resistance SHI-ETSU CHEMICAL CO., LTD. (JP) 2004-12-14 US disclosed
US-20030108819-A1 Resist patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-06-12 US disclosed
US-20030013039-A1 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (US) 2003-01-16 US disclosed
EP-1276012-A2 Resist patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-01-15 EP disclosed