Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 2/20 | 0.60 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.57 |
| ▸ | TSHR | P16473 | 6/20 | 0.57 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | GLO1 | Q04760 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | TP53 | P04637 | 2/20 | 0.33 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.32 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6353793 | 0.82 | SOAT1 (0.44) | THRBALDH1A1TSHRSOAT1HSD17B10 | |
| SCHEMBL6354928 | 0.81 | TDP1 (0.44) | THRBALDH1A1TSHRSOAT1HSD17B10 | |
| SCHEMBL6141329 | 0.81 | — | — | |
| SCHEMBL938633 | 0.80 | ALDH1A1 (0.68) | THRBALDH1A1TSHRSOAT1HSD17B10 | |
| SCHEMBL27597499 | 0.79 | ALDH1A1 (0.56) | THRBALDH1A1TSHRSOAT1HSD17B10 | |
| Acetic Acid SCHEMBL28148366 | 0.79 | ALDH1A1 (0.67) | THRBALDH1A1TSHRSOAT1HSD17B10 | |
| Propane SCHEMBL11376289 | 0.79 | SOAT1 (0.64) | THRBALDH1A1TSHRSOAT1HSD17B10 | |
| SCHEMBL1470310 | 0.78 | ALDH1A1 (0.65) | THRBALDH1A1TSHRSOAT1HSD17B10 | |
| SCHEMBL1470280 | 0.78 | ALDH1A1 (0.65) | THRBALDH1A1TSHRSOAT1HSD17B10 | |
| SCHEMBL11416400 | 0.78 | ALDH1A1 (0.65) | THRBALDH1A1TSHRSOAT1HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6974658-B2 | HIGH MOLECULAR COMPOUND, MONOMER COMPOUNDS AND PHOTOSENSITIVE COMPOSITION FOR PHOTORESIST, PATTERN FORMING METHOD UTILIZING PHOTOSENSITIVE COMPOSITION, AND METHOD OF MANUFACTURING ELECTRONIC COMPONENTS | KABUSHIKI KAISHA TOSHIBA (JP) | 2005-12-13 | — | — | US | disclosed |
| US-20030235781-A1 | High molecular compound, monomer compounds and photosensitive composition for photoresist, pattern forming method utilizing photosensitive composition, and method of manufacturing electronic components | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-12-25 | — | — | US | disclosed |