⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6352902 | 0.89 | BCHE (0.31) | — | |
| SCHEMBL6350384 | 0.88 | BCHE (0.30) | — | |
| SCHEMBL14870868 | 0.88 | — | — | |
| SCHEMBL14479063 | 0.86 | — | — | |
| SCHEMBL6353010 | 0.85 | — | — | |
| SCHEMBL15134099 | 0.85 | — | — | |
| SCHEMBL14870388 | 0.81 | — | — | |
| SCHEMBL7011176 | 0.80 | — | — | |
| SCHEMBL16604539 | 0.79 | PPM1B (0.30) | — | |
| SCHEMBL6353800 | 0.79 | BCHE (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9507258-B2 | Resin and photoresist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-11-29 | — | — | US | disclosed |
| US-20120115082-A1 | RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-05-10 | — | — | US | disclosed |