SCHEMBL6350384

SCHEMBL6350384

CCC(C)(C)C(=O)OCCNC(=O)OC1C2CC3C1OS(=O)(=O)C3C2C(F)(F)F

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
BCHE P06276 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6352902 0.91 BCHE (0.31) BCHE
SCHEMBL6353010 0.88
SCHEMBL6350348 0.88
SCHEMBL14870398 0.81
SCHEMBL6353800 0.81 BCHE (0.31) BCHE
SCHEMBL7013378 0.81
SCHEMBL15077127 0.78 BCHE (0.31) BCHE
SCHEMBL7011602 0.78
SCHEMBL6352750 0.77
SCHEMBL14870857 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9507258-B2 Resin and photoresist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-11-29 US disclosed
US-20120115082-A1 RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-05-10 US disclosed