⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL63219 | 0.82 | ENPEP (0.30) | — | |
| SCHEMBL338216 | 0.79 | ENPEP (0.46) | — | |
| SCHEMBL19497295 | 0.79 | — | — | |
| SCHEMBL5206816 | 0.79 | — | — | |
| SCHEMBL24215075 | 0.73 | — | — | |
| SCHEMBL29124180 | 0.73 | — | — | |
| SCHEMBL18465458 | 0.73 | — | — | |
| SCHEMBL62461 | 0.71 | — | — | |
| SCHEMBL10581071 | 0.69 | — | — | |
| SCHEMBL6937239 | 0.69 | ENPEP (0.43) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 229 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260008903-A1 | POLYTHIOL COMPOSITION AND USE THEREOF | Efirm New Material Co., Ltd. (CN) | 2026-01-08 | — | — | US | claimed |
| CN-120040703-A | Polythiol composition, polymerizable composition for optical product, and optical product | 益丰新材料股份有限公司 | 2025-05-27 | — | — | CN | claimed |
| CN-116768847-B | Thiol composition and application thereof in optical material | 益丰新材料股份有限公司 | 2025-04-29 | — | — | CN | claimed |
| CN-119751323-A | Preparation method of polythiol compound | 益丰新材料股份有限公司 | 2025-04-04 | — | — | CN | claimed |
| CN-118684609-A | Polythiol compound for avoiding explosion polymerization and material leakage and application thereof | 益丰新材料股份有限公司 | 2024-09-24 | — | — | CN | claimed |
| WO-2024188359-A1 | POLYTHIOL COMPOSITION AND USE THEREOF | 益丰新材料股份有限公司 | 2024-09-19 | — | — | WO | claimed |
| CN-117285688-B | Polythiol composition and application thereof | 益丰新材料股份有限公司 | 2024-08-30 | — | — | CN | claimed |
| CN-118063723-A | Polythiol composition, preparation method and application thereof, and optical material | 益丰新材料股份有限公司 | 2024-05-24 | — | — | CN | claimed |
| CN-117304082-A | Polythiol compound for optical resin lens, optical resin lens and preparation method of optical resin lens | 益丰新材料股份有限公司 | 2023-12-29 | — | — | CN | claimed |
| CN-117285688-A | Polythiol composition and application thereof | 益丰新材料股份有限公司 | 2023-12-26 | — | — | CN | claimed |
| CN-116640361-A | Release agent composition and application thereof | 益丰新材料股份有限公司 | 2023-08-25 | — | — | CN | claimed |
| WO-2023147792-A1 | POLYTHIOL COMPOSITION AND USE THEREOF | 益丰新材料股份有限公司 | 2023-08-10 | — | — | WO | claimed |
| CN-114790269-B | Polythiol composition and application thereof | 益丰新材料股份有限公司 | 2023-03-10 | — | — | CN | claimed |
| CN-114790269-A | Polythiol composition and application thereof | 益丰新材料股份有限公司 | 2022-07-26 | — | — | CN | claimed |
| US-11377433-B2 | Method for producing polyfunctional sulfur-containing epoxy compound | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-07-05 | — | — | US | claimed |
| US-20120238660-A1 | METHOD FOR DYEING A PLASTIC SUBSTRATE OF HIGH REFRACTIVE INDEX AND SUBSTRATE OBTAINED BY THIS METHOD | ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE) (FR) | 2012-09-20 | — | — | US | claimed |
| EP-2319981-B1 | Method for dyeing a plastic substrate of high refractive index | ESSILOR INT (FR) | 2012-02-29 | — | — | EP | claimed |
| WO-2011058460-A1 | METHOD FOR DYEING A PLASTIC SUBSTRATE OF HIGH REFRACTIVE INDEX AND SUBSTRATE OBTAINED BY THIS METHOD | Essilor International (Compagnie Générale d'Optique) (FR) | 2011-05-19 | — | — | WO | claimed |
| EP-2319981-A1 | Method for dyeing a plastic substrate of high refractive index and substrate obtained by this method | ESSILOR INTERNATIONAL (Compagnie Générale d'Optique) (FR) | 2011-05-11 | — | — | EP | claimed |
| US-6117923-A | OXIDATION RESISTANCE. POLYMERIZING A NOVEL SULFUR-CONTAINING COMPOUND HAVING AN EPISULFIDE STRUCTURE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2000-09-12 | — | — | US | claimed |