Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TRIM24 | O15164 | 2/20 | 0.36 |
| ▸ | TRIM33 | Q9UPN9 | 2/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.33 |
| ▸ | MAOA | P21397 | 1/20 | 0.33 |
| ▸ | MAOB | P27338 | 1/20 | 0.33 |
| ▸ | CDC25B | P30305 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL64573 | 0.89 | — | — | |
| SCHEMBL2141103 | 0.77 | — | — | |
| SCHEMBL3259171 | 0.75 | ALDH1A1 (0.46) | TRIM24TRIM33ALDH1A1CYP2A6MAOA | |
| SCHEMBL868289 | 0.75 | ALDH1A1 (0.46) | TRIM24TRIM33ALDH1A1CYP2A6MAOA | |
| SCHEMBL868287 | 0.75 | ALDH1A1 (0.46) | TRIM24TRIM33ALDH1A1CYP2A6MAOA | |
| SCHEMBL3262868 | 0.75 | ALDH1A1 (0.46) | TRIM24TRIM33ALDH1A1CYP2A6MAOA | |
| SCHEMBL3259174 | 0.75 | ALDH1A1 (0.46) | TRIM24TRIM33ALDH1A1CYP2A6MAOA | |
| SCHEMBL7791080 | 0.72 | ALDH1A1 (0.42) | TRIM24TRIM33ALDH1A1CYP2A6MAOA | |
| SCHEMBL6347518 | 0.72 | ALDH1A1 (0.42) | TRIM24TRIM33ALDH1A1 | |
| SCHEMBL7738645 | 0.72 | ALDH1A1 (0.42) | TRIM24TRIM33ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6974658-B2 | HIGH MOLECULAR COMPOUND, MONOMER COMPOUNDS AND PHOTOSENSITIVE COMPOSITION FOR PHOTORESIST, PATTERN FORMING METHOD UTILIZING PHOTOSENSITIVE COMPOSITION, AND METHOD OF MANUFACTURING ELECTRONIC COMPONENTS | KABUSHIKI KAISHA TOSHIBA (JP) | 2005-12-13 | — | — | US | disclosed |
| US-20030235781-A1 | High molecular compound, monomer compounds and photosensitive composition for photoresist, pattern forming method utilizing photosensitive composition, and method of manufacturing electronic components | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-12-25 | — | — | US | disclosed |
| US-6410748-B1 | Alicycli c group-containing monomer | KABUSHIKI KAISHA TOSHIBA (JP) | 2002-06-25 | — | — | US | disclosed |
| US-6291129-B1 | LIGHT SENSITIVE ELEMENT WITH UNSATURATED POLYMERS | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-09-18 | — | — | US | disclosed |