SCHEMBL6354630

SCHEMBL6354630

CCCS(=O)(=O)NC1CC2C=CC1C2

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 4/20 0.40
KDM4E B2RXH2 4/20 0.39
ALDH1A1 P00352 3/20 0.38
GAA P10253 2/20 0.38
TDP1 Q9NUW8 2/20 0.38
PSEN1 P49768 1/20 0.37
PSEN2 P49810 1/20 0.37
APH1B Q8WW43 1/20 0.37
NCSTN Q92542 1/20 0.37
APH1A Q96BI3 1/20 0.37
PSENEN Q9NZ42 1/20 0.37
LMNA P02545 1/20 0.32
NPC1 O15118 1/20 0.31
RECQL P46063 1/20 0.31
RAB9A P51151 1/20 0.31
MAPK1 P28482 1/20 0.30
JAK2 O60674 1/20 0.30
MAOA P21397 1/20 0.30
JAK1 P23458 1/20 0.30
TYK2 P29597 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6351919 0.88 EPHX2 (0.42) EPHX2KDM4EALDH1A1GAATDP1
SCHEMBL10171599 0.77 GAA (0.43) EPHX2KDM4EALDH1A1GAATDP1
SCHEMBL6351927 0.74 KDM4E (0.45) KDM4EALDH1A1TDP1PSEN1PSEN2
SCHEMBL775553 0.69 ALDH1A1 (0.40) EPHX2KDM4EALDH1A1GAATDP1
SCHEMBL13127107 0.69 ALDH1A1 (0.46) EPHX2KDM4EALDH1A1GAATDP1
SCHEMBL2632936 0.67 ALDH1A1 (0.38) EPHX2KDM4EALDH1A1GAATDP1
SCHEMBL31544466 0.66 JAK2 (0.39) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL1238556 0.65
SCHEMBL7013688 0.65 ALDH1A1 (0.36) EPHX2KDM4EALDH1A1GAATDP1
SCHEMBL6355414 0.64 KDM4E (0.42) EPHX2KDM4EALDH1A1TDP1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9507258-B2 Resin and photoresist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-11-29 US disclosed
US-9507258-B2 Resin and photoresist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-11-29 US disclosed
US-20120115082-A1 RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-05-10 US disclosed
US-20120115082-A1 RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-05-10 US disclosed