SCHEMBL6355604

SCHEMBL6355604

C=CC(F)(F)F.CC(=N)C=C(C)N.[Cu]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8348763 0.78
SCHEMBL6360201 0.78
SCHEMBL19955330 0.78
SCHEMBL20860761 0.67
SCHEMBL18676456 0.65
SCHEMBL18708924 0.63
Carbamic Acid SCHEMBL867375 0.63 ACHE (0.44)
SCHEMBL33041 0.63
SCHEMBL16090863 0.62
SCHEMBL24872254 0.61

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20050227007-A1 Volatile copper(I) complexes for deposition of copper films by atomic layer deposition E. I. DU PONT DE NEMOURS AND COMPANY 2005-10-13 US disclosed