Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9841192 | 0.83 | TSHR (0.32) | TSHR | |
| SCHEMBL4393312 | 0.82 | LMNA (0.42) | LMNAALDH1A1 | |
| SCHEMBL1470143 | 0.81 | LMNA (0.55) | LMNATSHRALDH1A1 | |
| SCHEMBL261707 | 0.80 | — | — | |
| SCHEMBL9724405 | 0.78 | LMNA (0.48) | LMNATSHRALDH1A1 | |
| SCHEMBL1557155 | 0.78 | TDP1 (0.39) | LMNATSHRALDH1A1 | |
| SCHEMBL7710806 | 0.78 | LMNA (0.46) | LMNAALDH1A1 | |
| SCHEMBL9847941 | 0.78 | TSHR (0.37) | LMNATSHR | |
| SCHEMBL1471511 | 0.77 | LMNA (0.50) | LMNATSHRALDH1A1 | |
| SCHEMBL8682742 | 0.77 | LMNA (0.50) | LMNAALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6974658-B2 | HIGH MOLECULAR COMPOUND, MONOMER COMPOUNDS AND PHOTOSENSITIVE COMPOSITION FOR PHOTORESIST, PATTERN FORMING METHOD UTILIZING PHOTOSENSITIVE COMPOSITION, AND METHOD OF MANUFACTURING ELECTRONIC COMPONENTS | KABUSHIKI KAISHA TOSHIBA (JP) | 2005-12-13 | — | — | US | disclosed |
| US-20030235781-A1 | High molecular compound, monomer compounds and photosensitive composition for photoresist, pattern forming method utilizing photosensitive composition, and method of manufacturing electronic components | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-12-25 | — | — | US | disclosed |