Propionaldehyde

Propionaldehyde

SCHEMBL6358038

CCC=O.[InH3]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5271797-A Method for patterning metal oxide thin film ROHM CO., LTD. (JP) 1993-12-21 US claimed
WO-2024185655-A1 MAGNETIC PARTICLES FOR EXTRACELLULAR VESICLE PURIFICATION, METHOD FOR PRODUCING SAME, AND METHOD FOR PURIFYING EXTRACELLULAR VESICLES 東ソー株式会社 2024-09-12 WO disclosed
US-20220206404-A1 HUMAN BODY-SAFE EXTERNAL ADDITIVE FOR TONER AND TONER MANUFACTURED USING SAME Sukgyung AT Co., Ltd. (KR) 2022-06-30 US disclosed
US-20180163070-A1 SOLUTION PROCESS FOR INSB NANOPARTICLES AND APPLICATION FOR IR DETECTORS MERCK PATENT GMBH (DE) 2018-06-14 US disclosed
EP-3303224-A1 SOLUTION PROCESS FOR INSB NANOPARTICLES AND APPLICATION FOR IR DETECTORS Merck Patent GmbH (DE) 2018-04-11 EP disclosed
US-9677183-B2 Electrocatalyst, electrode coating and electrode for the preparation of chlorine COVESTRO DEUTSCHLAND AG (DE) 2017-06-13 US disclosed
US-20170067172-A1 CATALYST COATING AND PROCESS FOR PRODUCTION THEREOF COVESTRO DEUTSCHLAND AG (DE) 2017-03-09 US disclosed
WO-2016192832-A1 SOLUTION PROCESS FOR INSB NANOPARTICLES AND APPLICATION FOR IR DETECTORS MERCK PATENT GMBH (DE) 2016-12-08 WO disclosed
US-20140224666-A1 ELECTROCATALYST, ELECTRODE COATING AND ELECTRODE FOR THE PREPARATION OF CHLORINE COVESTRO DEUTSCHLAND AG (DE) 2014-08-14 US disclosed
US-20140224667-A1 Catalyst Coating and Process for Production Thereof NANO-X-GMBH (DE) 2014-08-14 US disclosed
US-20050202583-A1 Antistatic film forming composition, and producing method for conductive film pattern, electron source and image display apparatus CANON KABUSHIKI KAISHA (JP) 2005-09-15 US disclosed
US-6235260-B1 HYDROLYZING METAL ALKOXIDE, THIN FILM, KRI INTERNATIONAL, INC. (JP) 2001-05-22 US disclosed
EP-0677593-B1 TRANSPARENT CONDUCTIVE FILM, TRANSPARENT CONDUCTIVE BASE MATERIAL, AND CONDUCTIVE MATERIAL IDEMITSU KOSAN CO (JP) 2000-03-22 EP disclosed
US-6013983-A Transparent colored conductive film DAI NIPPON PRINTING CO., LTD. (JP) 2000-01-11 US disclosed
US-5972527-A AMORPHOUS OXIDE CONTAINING INDIUM (IN) AND ZINC (ZN) AS MAIN CATION ELEMENTS AND HAVING AN ATOMIC RATIO OF IN, IN/(IN+ZN), OF 0.50 TO 0.90. IDEMITSU KOSAN CO., LTD. (JP) 1999-10-26 US disclosed
EP-0940368-A1 PROCESS FOR PREPARING In 2?O 3?-SnO 2? PRECURSOR SOL AND PROCESS FOR PREPARING THIN FILM OF In 2?O 3?-SnO 2? KRI International, Inc. (JP) 1999-09-08 EP disclosed
EP-0677593-A1 TRANSPARENT CONDUCTIVE FILM, TRANSPARENT CONDUCTIVE BASE MATERIAL, AND CONDUCTIVE MATERIAL IDEMITSU KOSAN COMPANY LIMITED (JP) 1995-10-18 EP disclosed
US-5271797-A Method for patterning metal oxide thin film ROHM CO., LTD. (JP) 1993-12-21 US disclosed