⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Propionaldehyde SCHEMBL1332840 | 0.95 | — | — | |
| Propionaldehyde SCHEMBL4992 | 0.95 | — | — | |
| Propionaldehyde SCHEMBL28164384 | 0.95 | — | — | |
| Propionaldehyde SCHEMBL5310572 | 0.95 | — | — | |
| Propionaldehyde SCHEMBL7323052 | 0.95 | — | — | |
| Propionaldehyde SCHEMBL6226130 | 0.90 | — | — | |
| Propionaldehyde SCHEMBL9135951 | 0.90 | — | — | |
| Propionaldehyde SCHEMBL105565 | 0.90 | — | — | |
| Propionaldehyde SCHEMBL6358038 | 0.90 | — | — | |
| Propionaldehyde SCHEMBL22115957 | 0.90 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6903035-B2 | Inorganic composition, film, and method of producing film | FUJI PHOTO FILM CO., LTD. (JP) | 2005-06-07 | — | — | US | claimed |
| US-20030116061-A1 | Inorganic composition, film, and method of producing film | FUJI PHOTO FILM CO., LTD. | 2003-06-26 | — | — | US | claimed |
| EP-1281689-A2 | Inorganic composition, film made therefrom, and method for producing such film | FUJI PHOTO FILM CO., LTD. (JP) | 2003-02-05 | — | — | EP | claimed |
| US-5271797-A | Method for patterning metal oxide thin film | ROHM CO., LTD. (JP) | 1993-12-21 | — | — | US | claimed |
| US-20100159128-A1 | Niobium 2-ethylhexanoate derivative, method of producing the derivative, organic acid metal salt composition containing the derivative, and method of producing thin film using the composition | YOSHINAKA ATSUYA | 2010-06-24 | — | — | US | disclosed |
| US-20090136658-A1 | Niobium 2-Ethylhexanoate Derivative, Method Of Producing The Derivative, Organic Acid Metal Salt Composition Containing The Derivative, And Method Of Producing Thin Film Using The Composition | ADEKA CORPORATION (JP) | 2009-05-28 | — | — | US | disclosed |
| US-7454836-B2 | Method for manufacturing inkjet head, and inkjet head | SEIKO EPSON CORPORATION (JP) | 2008-11-25 | — | — | US | disclosed |
| US-20070214621-A1 | METHOD FOR MANUFACTURING INKJET HEAD, AND INKJET HEAD | SEIKO EPSON CORPORATION (JP) | 2007-09-20 | — | — | US | disclosed |
| US-6903035-B2 | Inorganic composition, film, and method of producing film | FUJI PHOTO FILM CO., LTD. (JP) | 2005-06-07 | — | — | US | disclosed |
| US-20030116061-A1 | Inorganic composition, film, and method of producing film | FUJI PHOTO FILM CO., LTD. | 2003-06-26 | — | — | US | disclosed |
| EP-1281689-A2 | Inorganic composition, film made therefrom, and method for producing such film | FUJI PHOTO FILM CO., LTD. (JP) | 2003-02-05 | — | — | EP | disclosed |
| US-5833745-A | BISMUTH, STRONTIUM, RARE EARTH, TANTALUM OR NIOBIUM OXIDE, CAPACITORS, COATING ALKOXIDES OR CARBOXYLIC ACID SALTS ONTO SUBSTRATE, DRYING, CALCINING, CRYSTALLIZATION BY BURNING, REMANENT POLARIZATION, FATIGUE RESISTANCE | MITSUBISHI MATERIALS CORPORATION (JP) | 1998-11-10 | — | — | US | disclosed |
| US-5807495-A | Bi-based dielectric thin films, and compositions and method for forming them | MITSUBISHI MATERIALS CORPORATION (JP) | 1998-09-15 | — | — | US | disclosed |
| US-5271797-A | Method for patterning metal oxide thin film | ROHM CO., LTD. (JP) | 1993-12-21 | — | — | US | disclosed |