SCHEMBL6364670

SCHEMBL6364670

C(#Cc1cccc2ccccc12)c1ccc(C#Cc2cccc3ccccc23)cc1

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHAT P28329 1/20 0.68
ACACB O00763 1/20 0.52
GRM5 P41594 1/20 0.49
MEN1 O00255 3/20 0.47
KMT2A Q03164 3/20 0.47
MAPT P10636 2/20 0.47
MITF O75030 1/20 0.47
HTT P42858 1/20 0.47
RAD52 P43351 1/20 0.47
HRH3 Q9Y5N1 1/20 0.46
ALDH1A1 P00352 5/20 0.44
KDM4E B2RXH2 2/20 0.44
POLB P06746 1/20 0.44
CA1 P00915 1/20 0.44
CA2 P00918 1/20 0.44
SLC16A3 O15427 1/20 0.43
CYP1A2 P05177 4/20 0.43
HSD17B10 Q99714 3/20 0.43
CYP3A4 P08684 2/20 0.43
HPGD P15428 2/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzene SCHEMBL28841286 0.93 CHAT (0.66) CHATACACBGRM5MEN1KMT2A
SCHEMBL29793886 0.93 CHAT (0.66) CHATACACBGRM5MEN1KMT2A
SCHEMBL2773275 0.93 CHAT (0.66) CHATACACBGRM5MEN1KMT2A
SCHEMBL29661843 0.91 CHAT (0.60) CHATACACBGRM5MEN1KMT2A
SCHEMBL2776015 0.91 CHAT (0.60) CHATACACBGRM5MEN1KMT2A
SCHEMBL2474672 0.90 CHAT (0.58) CHATACACBGRM5MEN1KMT2A
SCHEMBL3449893 0.90 CHAT (0.58) CHATACACBGRM5MEN1KMT2A
SCHEMBL6364668 0.88 CHAT (0.58) CHATACACBGRM5MEN1KMT2A
SCHEMBL21858054 0.86 CHAT (0.58) CHATACACBGRM5MEN1KMT2A
SCHEMBL704830 0.86 CHAT (0.58) CHATACACBGRM5KMT2AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6884571-B2 Intermediate layer composition for three-layer resist process and pattern formation method using the same FUJI PHOTO FILM CO., LTD (JP) 2005-04-26 US disclosed
US-20030207208-A1 Intermediate layer composition for three-layer resist process and pattern formation method using the same FUJI PHOTO FILM CO., LTD. 2003-11-06 US disclosed