SCHEMBL6364668

SCHEMBL6364668

C(#Cc1cccc2ccccc12)c1ccccc1C#Cc1cccc2ccccc12

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHAT P28329 1/20 0.58
GRM5 P41594 1/20 0.53
CA1 P00915 1/20 0.48
CA2 P00918 1/20 0.48
ALDH1A1 P00352 7/20 0.48
HSD17B10 Q99714 5/20 0.48
CYP2A6 P11509 3/20 0.48
TSHR P16473 2/20 0.48
TDP1 Q9NUW8 2/20 0.48
CYP1A2 P05177 4/20 0.44
HPGD P15428 3/20 0.44
CYP3A4 P08684 2/20 0.44
KEAP1 Q14145 1/20 0.44
HTT P42858 2/20 0.44
MEN1 O00255 2/20 0.44
KMT2A Q03164 2/20 0.44
MITF O75030 1/20 0.44
MAPT P10636 1/20 0.44
RAD52 P43351 1/20 0.44
HPRT1 P00492 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2776015 0.97 CHAT (0.60) CHATGRM5CA1CA2ALDH1A1
SCHEMBL29661843 0.97 CHAT (0.60) CHATGRM5CA1CA2ALDH1A1
SCHEMBL6364670 0.88 CHAT (0.68) CHATGRM5CA1CA2ALDH1A1
SCHEMBL29798114 0.88 CHAT (0.53) CHATGRM5CA1CA2ALDH1A1
SCHEMBL5014214 0.87 CHAT (0.52) CHATGRM5CA1CA2ALDH1A1
SCHEMBL29793886 0.86 CHAT (0.66) CHATGRM5CA1CA2ALDH1A1
Benzene SCHEMBL28841286 0.86 CHAT (0.66) CHATGRM5CA1CA2ALDH1A1
SCHEMBL2773275 0.86 CHAT (0.66) CHATGRM5CA1CA2ALDH1A1
SCHEMBL5881377 0.85 CA1 (0.50) CHATGRM5CA1CA2ALDH1A1
SCHEMBL28836680 0.85 ALDH1A1 (0.50) CHATGRM5CA1CA2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6884571-B2 Intermediate layer composition for three-layer resist process and pattern formation method using the same FUJI PHOTO FILM CO., LTD (JP) 2005-04-26 US disclosed
US-20030207208-A1 Intermediate layer composition for three-layer resist process and pattern formation method using the same FUJI PHOTO FILM CO., LTD. 2003-11-06 US disclosed