SCHEMBL6364807

SCHEMBL6364807

CC#Cc1ccccc1C#CC

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 3/20 0.46
CYP1A1 P04798 2/20 0.46
CYP1B1 Q16678 2/20 0.46
TSHR P16473 4/20 0.38
APP P05067 1/20 0.35
MAPT P10636 2/20 0.33
KDM4E B2RXH2 1/20 0.33
MEN1 O00255 1/20 0.33
NPC1 O15118 1/20 0.33
ALDH1A1 P00352 1/20 0.33
CYP3A4 P08684 1/20 0.33
CYP2C9 P11712 1/20 0.33
HPGD P15428 1/20 0.33
CYP2C19 P33261 1/20 0.33
KMT2A Q03164 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
HSD17B10 Q99714 1/20 0.33
KCNH2 Q12809 1/20 0.32
ACHE P22303 2/20 0.32
LMNA P02545 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22431367 0.87 TSHR (0.52) CYP1A2CYP1A1CYP1B1TSHRKDM4E
SCHEMBL10437173 0.84 APP (0.57) CYP1A2CYP1A1CYP1B1APPMAPT
SCHEMBL29994030 0.83 TSHR (0.54) CYP1A2CYP1A1CYP1B1TSHRMAPT
SCHEMBL3645322 0.83 TSHR (0.54) CYP1A2CYP1A1CYP1B1TSHRMAPT
SCHEMBL18897654 0.83 TSHR (0.38) CYP1A2CYP1A1CYP1B1TSHR
SCHEMBL2462120 0.81 KCNH2 (0.53) CYP1A2CYP1A1CYP1B1TSHRALDH1A1
SCHEMBL29994303 0.81 KCNH2 (0.53) CYP1A2CYP1A1CYP1B1TSHRALDH1A1
SCHEMBL449613 0.81 CYP3A4 (0.58) CYP1A2CYP1A1CYP1B1TSHRAPP
SCHEMBL8767077 0.81 GRM5 (0.46) CYP1A2CYP1A1CYP1B1ACHE
SCHEMBL2089353 0.81 ALDH1A1 (0.40) CYP1A2CYP1A1CYP1B1TSHRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6884571-B2 Intermediate layer composition for three-layer resist process and pattern formation method using the same FUJI PHOTO FILM CO., LTD (JP) 2005-04-26 US disclosed
US-20030207208-A1 Intermediate layer composition for three-layer resist process and pattern formation method using the same FUJI PHOTO FILM CO., LTD. 2003-11-06 US disclosed