⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7596159 | 0.75 | — | — | |
| SCHEMBL657864 | 0.75 | — | — | |
| SCHEMBL12144404 | 0.74 | ALDH1A1 (0.33) | — | |
| SCHEMBL14583133 | 0.74 | CA1 (0.36) | — | |
| SCHEMBL19320562 | 0.73 | ALDH1A1 (0.39) | — | |
| Hydrochloric Acid SCHEMBL28167649 | 0.72 | TSHR (0.32) | — | |
| SCHEMBL4433113 | 0.72 | — | — | |
| Ammonia Solution, Strong SCHEMBL28253245 | 0.72 | TSHR (0.32) | — | |
| SCHEMBL18081341 | 0.72 | — | — | |
| SCHEMBL6366627 | 0.72 | F2 (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8987386-B2 | Method of producing polymeric compound, resist composition, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-03-24 | — | — | US | disclosed |
| US-20120328993-A1 | METHOD OF PRODUCING POLYMERIC COMPOUND, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-12-27 | — | — | US | disclosed |
| US-8173354-B2 | Sulfonium salt, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-08 | — | — | US | disclosed |
| US-20110008735-A1 | SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-01-13 | — | — | US | disclosed |