SCHEMBL636854

SCHEMBL636854

C=CC(=O)OCC1CS1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14010704 0.86 TSHR (0.36)
SCHEMBL5209049 0.86 TSHR (0.36)
SCHEMBL14409303 0.86 TSHR (0.36)
SCHEMBL6862334 0.84 TSHR (0.37)
SCHEMBL5209736 0.82 TSHR (0.37)
SCHEMBL5204936 0.82 TSHR (0.37)
SCHEMBL5210025 0.81 TSHR (0.40)
SCHEMBL2375750 0.80 TSHR (0.37)
SCHEMBL5206624 0.79 TSHR (0.32)
SCHEMBL5208212 0.79 THRB (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 145 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1366097-B1 ALL POLYMER PROCESS COMPATIBLE OPTICAL POLYMER MATERIAL CORNING INC (US) 2007-05-09 EP claimed
EP-1366097-A2 ALL POLYMER PROCESS COMPATIBLE OPTICAL POLYMER MATERIAL Corning Incorporated (US) 2003-12-03 EP claimed
US-6503421-B1 Waveguide from terploymer containing such as pentafluoro-phenyl maleimide, a monomer having vinyl and curable ring opening groups and other free radical monomers; thermal and weather stability; low thermal expansion and optical loss CORNING INCORPORATED 2003-01-07 US claimed
WO-2002036647-A2 ALL POLYMER PROCESS COMPATIBLE OPTICAL POLYMER MATERIAL CORNING INCORPORATED (US) 2002-05-10 WO claimed
US-6201061-B1 CURING A RESIN FOR OPTICAL USE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2001-03-13 US claimed
US-6197226-B1 COMPRISING DIPPING RESIN INTO A LIQUID CONTAINING POLAR COMPOUND SELECTED FROM POLAR INORGANIC COMPOUNDS AND POLAR ORGANIC COMPOUNDS AND TINTING RESIN, WHEREIN RESIN IS OBTAINED BY CURING BY POLYMERIZATION A SULFUR CONTAINING COMPOUND MITSUBISHI GAS CHEMICAL COMPANY (JP) 2001-03-06 US claimed
US-5663401-A Phosphorus- and sulfur-containing acrylates and methacrylates ATOCHEM (FR) 1997-09-02 US claimed
US-5425122-A Drawable linear polymer rod having continuous refractive index gradient distributed from peripheral portion to central portion and having crosslinkable functional groups NIPPON PETROCHEMICALS COMPANY, LIMITED (JP) 1995-06-13 US claimed
EP-0012652-B1 PROCESS FOR GLUEING TWO PARTS BY MEANS OF A PHOTOPOLYMERIZABLE SUBSTANCE AND ARRANGEMENTS COMPRIZING TWO PARTS UNITED BY AN INTERMEDIATE PHOTOPOLYMERIZABLE LAYER THOMSON-CSF (FR) 1982-07-07 EP claimed
US-4272589-A Process for gluing two members using a photopolymerizable substance THOMSON-CSF (FR) 1981-06-09 US claimed
JP-61283605-A None JP disclosed
JP-54073892-A None JP disclosed
JP-57059920-A None JP disclosed
JP-57158253-A None JP disclosed
JP-59179506-A None JP disclosed
JP-S57158253-A PHOTO-CROSSLINKABLE RESIN COMPOSITION EGAWA HIROAKI 1982-09-30 JP disclosed
JP-S5759920-A PHOTOCROSSLINKABLE RESIN COMPOSITION EGAWA HIROAKI 1982-04-10 JP disclosed
EP-0043159-A1 Porous inorganic support material coated with an organic stationary phase, for use in chromatography, and process for its preparation AKZO N.V. (NL) 1982-01-06 EP disclosed
US-4272589-A Process for gluing two members using a photopolymerizable substance THOMSON-CSF (FR) 1981-06-09 US disclosed
JP-S5473892-A PRODUCTION OF METHYL METHACRYLATE POLYMER MITSUBISHI CHEM IND LTD 1979-06-13 JP disclosed