Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GNAI3 | P08754 | 1/20 | 0.31 |
| ▸ | GNAO1 | P09471 | 1/20 | 0.31 |
| ▸ | GNAI1 | P63096 | 1/20 | 0.31 |
| ▸ | OPRL1 | P41146 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28031284 | 0.86 | GNAI3 (0.37) | GNAI3GNAO1GNAI1 | |
| SCHEMBL11121626 | 0.85 | GNAI3 (0.40) | GNAI3GNAO1GNAI1 | |
| SCHEMBL19321833 | 0.81 | KDM1A (0.33) | — | |
| SCHEMBL635169 | 0.80 | OPRL1 (0.32) | OPRL1 | |
| SCHEMBL5221830 | 0.79 | — | — | |
| SCHEMBL2965528 | 0.78 | GNAI3 (0.32) | GNAI3GNAO1GNAI1OPRL1 | |
| Hydrochloric Acid SCHEMBL29030884 | 0.78 | GNAI3 (0.32) | GNAI3GNAO1GNAI1OPRL1 | |
| Hydrochloric Acid SCHEMBL20721240 | 0.76 | — | — | |
| SCHEMBL23953159 | 0.76 | GNAI3 (0.31) | GNAI3GNAO1GNAI1OPRL1 | |
| SCHEMBL30890403 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 142 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2026089879-A1 | ETHYLENICALLY UNSATURATED COMPOUNDS, METHODS FOR THEIR PREPARATION, AND THE USE THEREOF IN COATING COMPOSITIONS | COVESTRO LLC (US) | 2026-04-30 | — | — | WO | disclosed |
| WO-2026089883-A1 | ETHYLENICALLY UNSATURATED OLIGOMERS, METHODS FOR THEIR PREPARATION, AND THE USE THEREOF IN COATING COMPOSITIONS | COVESTRO LLC (US) | 2026-04-30 | — | — | WO | disclosed |
| WO-2026089881-A1 | ETHYLENICALLY UNSATURATED OLIGOMER COMPOSITIONS, METHODS FOR THEIR PREPARATION, AND THE USE THEREOF IN COATING COMPOSITIONS | COVESTRO LLC (US) | 2026-04-30 | — | — | WO | disclosed |
| US-20250340690-A1 | ETHYLENICALLY UNSATURATED COMPOUNDS, METHODS FOR THEIR PREPARATION, AND THE USE THEREOF IN COATING COMPOSITIONS | COVESTRO LLC (US) | 2025-11-06 | — | — | US | disclosed |
| US-12428514-B2 | Ethylenically unsaturated compounds, methods for their preparation, and the use thereof in coating compositions | COVESTRO LLC (US) | 2025-09-30 | — | — | US | disclosed |
| US-20250215134-A1 | ETHYLENICALLY UNSATURATED COMPOUNDS, METHODS FOR THEIR PREPARATION, AND THE USE THEREOF IN COATING COMPOSITIONS | COVESTRO LLC | 2025-07-03 | — | — | US | disclosed |
| US-20250215139-A1 | ETHYLENICALLY UNSATURATED OLIGOMERS, METHODS FOR THEIR PREPARATION, AND THE USE THEREOF IN COATING COMPOSITIONS | COVESTRO LLC | 2025-07-03 | — | — | US | disclosed |
| US-20250207285-A1 | ADDITIVE FOR ACIDIC ZINC ALLOY PLATING BATH, ACIDIC ZINC ALLOY PLATING BATH AND ZINC ALLOY PLATING FILM | YUKEN INDUSTRY CO., LTD. (JP) | 2025-06-26 | — | — | US | disclosed |
| US-12187852-B1 | Ethylenically unsaturated oligomers, methods for their preparation, and the use thereof in coating compositions | COVESTRO LLC (US) | 2025-01-07 | — | — | US | disclosed |
| US-20250006940-A1 | CONDUCTIVE PIGMENT PASTE, MIXTURE PASTE, AND ELECTRODE FOR LITHIUM ION BATTERY | KANSAI PAINT CO., LTD. (JP) | 2025-01-02 | — | — | US | disclosed |
| EP-1216233-A1 | QUINAZOLINONES | MERCK PATENT GmbH (DE) | 2002-06-26 | — | — | EP | disclosed |
| EP-1211276-A2 | Optical product, asymmetric disulfide compound used therefor and method for producing the asymmetric disulfide compound | HOYA CORPORATION (JP) | 2002-06-05 | — | — | EP | disclosed |
| EP-1099721-A1 | Composition for producing resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2001-05-16 | — | — | EP | disclosed |
| WO-2001023364-A1 | QUINAZOLINONES | MERCK PATENT GMBH (DE) | 2001-04-05 | — | — | WO | disclosed |
| US-6117923-A | OXIDATION RESISTANCE. POLYMERIZING A NOVEL SULFUR-CONTAINING COMPOUND HAVING AN EPISULFIDE STRUCTURE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2000-09-12 | — | — | US | disclosed |
| US-5945504-A | Episulfide compound | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1999-08-31 | — | — | US | disclosed |
| EP-0874016-A2 | Novel resin for optical material | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1998-10-28 | — | — | EP | disclosed |
| US-5807975-A | Alkyl sulfide type episulfide compound | MITSUBISHI GAS CHEMICAL COMPANY,INC. (JP) | 1998-09-15 | — | — | US | disclosed |
| EP-0785194-A1 | Episulfide compound | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1997-07-23 | — | — | EP | disclosed |
| EP-0761665-A2 | Episulfide group containing alkyl sulfide compounds | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1997-03-12 | — | — | EP | disclosed |