Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 5/20 | 0.56 |
| ▸ | CA6 | P23280 | 5/20 | 0.56 |
| ▸ | CA7 | P43166 | 5/20 | 0.56 |
| ▸ | CA9 | Q16790 | 5/20 | 0.56 |
| ▸ | CA14 | Q9ULX7 | 5/20 | 0.56 |
| ▸ | CA5B | Q9Y2D0 | 5/20 | 0.56 |
| ▸ | MEN1 | O00255 | 2/20 | 0.56 |
| ▸ | RECQL | P46063 | 2/20 | 0.56 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.56 |
| ▸ | CA2 | P00918 | 4/20 | 0.53 |
| ▸ | CA4 | P22748 | 4/20 | 0.53 |
| ▸ | CA5A | P35218 | 4/20 | 0.53 |
| ▸ | LMNA | P02545 | 3/20 | 0.53 |
| ▸ | CA3 | P07451 | 3/20 | 0.53 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.53 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.53 |
| ▸ | CA1 | P00915 | 2/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.53 |
| ▸ | TP53 | P04637 | 1/20 | 0.53 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trientine SCHEMBL6369346 | 0.97 | CA12 (0.58) | CA12CA6CA7CA9CA14 | |
| Phosphonic Acid SCHEMBL6544748 | 0.94 | CA12 (0.62) | CA12CA6CA7CA9CA14 | |
| Phosphonic Acid SCHEMBL7029915 | 0.94 | CA12 (0.62) | CA12CA6CA7CA9CA14 | |
| Trientine SCHEMBL10411239 | 0.92 | CA12 (0.65) | CA12CA6CA7CA9CA14 | |
| Trientine SCHEMBL31194270 | 0.89 | CA12 (0.61) | CA12CA6CA7CA9CA14 | |
| Phosphonic Acid SCHEMBL5902929 | 0.86 | CA12 (0.53) | CA12CA6CA7CA9CA14 | |
| Cyclopentane SCHEMBL124978 | 0.86 | CA12 (0.53) | CA12CA6CA7CA9CA14 | |
| Phosphonic Acid SCHEMBL6247541 | 0.86 | CA12 (0.53) | CA12CA6CA7CA9CA14 | |
| Cyclopentane SCHEMBL6404767 | 0.84 | CA12 (0.50) | CA12CA6CA7CA9CA14 | |
| Trientine SCHEMBL6364948 | 0.84 | CA12 (0.55) | CA12CA6CA7CA9CA14 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114317135-B | Cleaning agent for solar silicon wafer after texturing and cleaning process thereof | 嘉兴市小辰光伏科技有限公司 | 2023-10-10 | — | — | CN | claimed |
| CN-114361290-A | Additive for removing poly-Si winding plating made of TOPCon battery and cleaning process thereof | 嘉兴市小辰光伏科技有限公司 | 2022-04-15 | — | — | CN | claimed |
| CN-114317135-A | Cleaning agent for solar silicon wafer after texturing and cleaning process thereof | 嘉兴市小辰光伏科技有限公司 | 2022-04-12 | — | — | CN | claimed |
| CN-114806752-B | Single-component cleaning agent with high free alkalinity for monocrystalline large-size silicon wafer | 武汉宜田科技发展有限公司 | 2023-09-01 | — | — | CN | disclosed |
| CN-114806752-A | High-free-alkalinity single-component cleaning agent for monocrystalline large-size silicon wafer | 武汉宜田科技发展有限公司 | 2022-07-29 | — | — | CN | disclosed |
| CN-114361290-B | Additive for removing poly-Si winding plating made of TOPCon battery and cleaning process thereof | 嘉兴市小辰光伏科技有限公司 | 2022-07-15 | — | — | CN | disclosed |
| CN-114361290-A | Additive for removing poly-Si winding plating made of TOPCon battery and cleaning process thereof | 嘉兴市小辰光伏科技有限公司 | 2022-04-15 | — | — | CN | disclosed |
| US-11203731-B2 | Composition for surface treatment and method of producing the same, surface treatment method, and method of producing semiconductor substrate | FUJIMI INCORPORATED (JP) | 2021-12-21 | — | — | US | disclosed |
| US-20210130735-A1 | COMPOSITION FOR SURFACE TREATMENT AND METHOD OF PRODUCING THE SAME, SURFACE TREATMENT METHOD, AND METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE | FUJIMI INCORPORATED (JP) | 2021-05-06 | — | — | US | disclosed |
| US-20050204639-A1 | Polishing composition and polishing method | FUJIMI INCORPORATED (JP) | 2005-09-22 | — | — | US | disclosed |
| US-20050205837-A1 | Polishing composition and polishing method | FUJIMI INCORPORATED (JP) | 2005-09-22 | — | — | US | disclosed |