SCHEMBL637103

SCHEMBL637103

CC1(N=C=O)CSC(N=C=O)CS1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1548331 0.69 ALDH1A1 (0.30)
SCHEMBL331270 0.68 ALDH1A1 (0.36)
SCHEMBL28389230 0.65
SCHEMBL27609299 0.64
SCHEMBL1719152 0.60
SCHEMBL27328672 0.59
SCHEMBL26676794 0.55 ALDH1A1 (0.30)
SCHEMBL3086575 0.55 ALDH1A1 (0.33)
SCHEMBL3093523 0.55 ALDH1A1 (0.33)
SCHEMBL8172097 0.55

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 371 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260008903-A1 POLYTHIOL COMPOSITION AND USE THEREOF Efirm New Material Co., Ltd. (CN) 2026-01-08 US claimed
CN-117126594-A Optical coating composition, optical coating and photovoltaic module comprising optical coating composition 浙江福斯特新材料研究院有限公司 2023-11-28 CN claimed
CN-116640361-A Release agent composition and application thereof 益丰新材料股份有限公司 2023-08-25 CN claimed
WO-2023147792-A1 POLYTHIOL COMPOSITION AND USE THEREOF 益丰新材料股份有限公司 2023-08-10 WO claimed
CN-113454129-B Curable resin composition and cured product thereof 住友精化株式会社 2023-03-28 CN claimed
CN-114790269-B Polythiol composition and application thereof 益丰新材料股份有限公司 2023-03-10 CN claimed
CN-114790269-A Polythiol composition and application thereof 益丰新材料股份有限公司 2022-07-26 CN claimed
US-9914799-B2 Composition for optical material and method for producing same, and optical material produced from composition for optical material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2018-03-13 US claimed
EP-2894177-B1 COMPOSITION FOR OPTICAL MATERIAL, AND METHOD FOR PRODUCING SAME MITSUBISHI GAS CHEMICAL CO (JP) 2017-11-08 EP claimed
US-20170051095-A1 COMPOSITION FOR OPTICAL MATERIAL AND METHOD FOR PRODUCING SAME, AND OPTICAL MATERIAL PRODUCED FROM COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2017-02-23 US claimed
EP-2894177-A1 COMPOSITION FOR OPTICAL MATERIAL, AND METHOD FOR PRODUCING SAME Mitsubishi Gas Chemical Company, Inc. (JP) 2015-07-15 EP claimed
US-20150166720-A1 COMPOSITION FOR OPTICAL MATERIAL, AND METHOD FOR PRODUCING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2015-06-18 US claimed
EP-2829564-A1 METHOD FOR PRODUCING OPTICAL MATERIAL Mitsubishi Gas Chemical Company, Inc. (JP) 2015-01-28 EP claimed
US-20150011704-A1 METHOD FOR PRODUCING OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2015-01-08 US claimed
EP-1316819-B1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2005-11-23 EP claimed
US-20040026658-A1 Composition for optical material MITSUBISHI GAS CHEMICAL COMPANY INC. (JP) 2004-02-12 US claimed
EP-1316819-A1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-06-04 EP claimed
EP-0803504-B1 The process of producing polythiol oligomer HOYA CORP (JP) 2001-09-19 EP claimed
US-5961889-A REACTING 2,5-DIMERCAPTOMETHYL-1,4-DITHIANE (DMMD) WITH SULFUR IN A MOLAR RATIO 2:1 OR 3:2 IN THE PRESENCE OF A BASIC CATALYST HOYA CORPORATION (JP) 1999-10-05 US claimed
EP-0803504-A2 The process of producing polythiol oligomer HOYA CORPORATION (JP) 1997-10-29 EP claimed