SCHEMBL637116

SCHEMBL637116

CC1SC1c1ccccc1Sc1ccccc1C1SC1C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6790936 0.73 TSHR (0.41)
SCHEMBL635175 0.70 HSPA5 (0.34)
SCHEMBL636190 0.67 GAA (0.39)
SCHEMBL1093485 0.65 HTR2C (0.38)
SCHEMBL9101047 0.64 HTR2A (0.43)
SCHEMBL13937548 0.63 SMN1; SMN2 (0.39)
SCHEMBL5887367 0.61 PTGDR2 (0.41)
SCHEMBL18887229 0.58
SCHEMBL31070318 0.58 GPR3 (0.39)
SCHEMBL11574827 0.58 GPR3 (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6201061-B1 CURING A RESIN FOR OPTICAL USE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2001-03-13 US claimed
EP-1775315-B1 POLYMERIZABLE COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2012-02-22 EP disclosed
EP-1398317-B1 ALICYCLIC COMPOUND FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2011-01-12 EP disclosed
EP-1319966-B1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2010-05-26 EP disclosed
EP-1426392-B1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2010-02-24 EP disclosed
EP-1378535-B1 POLYMERIZATION REGULATORS AND COMPOSITIONS FOR RESIN MITSUBISHI GAS CHEMICAL CO (JP) 2009-11-11 EP disclosed
EP-1524289-B1 POLYMERIZABLE COMPOSITION, OPTICAL MATERIAL COMPRISING THE COMPOSITION AND METHOD FOR PRODUCING THE MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2009-09-16 EP disclosed
EP-1006374-B1 Process for producing a resin having a large refractive index MITSUBISHI GAS CHEMICAL CO (JP) 2009-01-07 EP disclosed
US-7446163-B2 Polymerization regulator and composition for resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2008-11-04 US disclosed
US-20080097045-A1 Polymerizable Composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2008-04-24 US disclosed
EP-1099721-A1 Composition for producing resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2001-05-16 EP disclosed
US-6201061-B1 CURING A RESIN FOR OPTICAL USE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2001-03-13 US disclosed
US-6197226-B1 COMPRISING DIPPING RESIN INTO A LIQUID CONTAINING POLAR COMPOUND SELECTED FROM POLAR INORGANIC COMPOUNDS AND POLAR ORGANIC COMPOUNDS AND TINTING RESIN, WHEREIN RESIN IS OBTAINED BY CURING BY POLYMERIZATION A SULFUR CONTAINING COMPOUND MITSUBISHI GAS CHEMICAL COMPANY (JP) 2001-03-06 US disclosed
US-6180753-B1 ADDING ACIDS, CURING AND SOLIDIFICATION WITH CASTING MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2001-01-30 US disclosed
EP-1046931-A2 Composition for optical materials MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2000-10-25 EP disclosed
EP-1024223-A2 Process for tinting a resin for optical materials MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2000-08-02 EP disclosed
EP-1006374-A2 Process for producing a resin having a large refractive index MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2000-06-07 EP disclosed
EP-0980696-A1 Process for treating a compound having epithio structures for disposal MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2000-02-23 EP disclosed
EP-0950905-A2 Process for producing a novel resin for optical materials having excellent color tone and transparency MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1999-10-20 EP disclosed
EP-0928802-A2 Process for tinting a resin having a large refractivity index and optical material tinted by the process MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1999-07-14 EP disclosed