SCHEMBL637632

SCHEMBL637632

SCCC1CSC(CCS)CS1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1402666 0.97
SCHEMBL7633017 0.87
SCHEMBL4306122 0.82
SCHEMBL5212594 0.78
SCHEMBL2229378 0.78
SCHEMBL5180759 0.76
SCHEMBL17961645 0.76
SCHEMBL635865 0.75
SCHEMBL5211729 0.67
SCHEMBL7058310 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 219 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116903812-A Thiol ester composition, optical resin and optical resin product 益丰新材料股份有限公司 2023-10-20 CN claimed
EP-2829564-B1 METHOD FOR PRODUCING OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2016-09-21 EP claimed
EP-2455413-B1 OPTICAL MATERIAL, OPTICAL LENS, AND METHOD FOR MANUFACTURING AN OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2016-08-31 EP claimed
US-9322957-B2 Method for producing optical material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2016-04-26 US claimed
EP-2829564-A1 METHOD FOR PRODUCING OPTICAL MATERIAL Mitsubishi Gas Chemical Company, Inc. (JP) 2015-01-28 EP claimed
US-20150011704-A1 METHOD FOR PRODUCING OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2015-01-08 US claimed
EP-2455413-A1 OPTICAL MATERIAL, OPTICAL LENS, AND METHOD FOR MANUFACTURING AN OPTICAL MATERIAL Mitsubishi Gas Chemical Company, Inc. (JP) 2012-05-23 EP claimed
US-20120123081-A1 OPTICAL MATERIAL PRODUCTION PROCESS, OPTICAL MATERIAL AND OPTICAL LENS MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-05-17 US claimed
US-6117923-A OXIDATION RESISTANCE. POLYMERIZING A NOVEL SULFUR-CONTAINING COMPOUND HAVING AN EPISULFIDE STRUCTURE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2000-09-12 US claimed
US-12595338-B2 Process for preparing a hydroxy group functionalized thioether BASF SE (DE) 2026-04-07 US disclosed
US-12552902-B2 Composition for optical material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2026-02-17 US disclosed
WO-2025089145-A1 POLYMERIZABLE COMPOSITION AND RESIN OBTAINED BY POLYMERIZING AND CURING SAME 三菱瓦斯化学株式会社 2025-05-01 WO disclosed
US-12287450-B2 Functional laminate and functional lens comprising the functional laminate TOKUYAMA CORPORATION (JP) 2025-04-29 US disclosed
WO-2024228342-A1 POLYMERIZABLE COMPOSITION, RESIN OBTAINED BY POLYMERIZING AND CURING SAME, AND OPTICAL MATERIAL COMPRISING SAID RESIN 三菱瓦斯化学株式会社 2024-11-07 WO disclosed
US-5945504-A Episulfide compound MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1999-08-31 US disclosed
EP-0936233-A2 Composition for a resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1999-08-18 EP disclosed
EP-0928802-A2 Process for tinting a resin having a large refractivity index and optical material tinted by the process MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1999-07-14 EP disclosed
EP-0921417-A2 Epoxy/episulfide resin compositions for optical materials MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1999-06-09 EP disclosed
EP-0874016-A2 Novel resin for optical material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1998-10-28 EP disclosed
EP-0785194-A1 Episulfide compound MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1997-07-23 EP disclosed