SCHEMBL7633017

SCHEMBL7633017

SCCC1CSC(S)CS1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL637632 0.87
SCHEMBL1402666 0.84
SCHEMBL4306122 0.72
SCHEMBL5212594 0.68
SCHEMBL2229378 0.68
SCHEMBL17961645 0.67
SCHEMBL5180759 0.67
SCHEMBL14414697 0.66
SCHEMBL635865 0.65
SCHEMBL5211729 0.59

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240084136-A1 PHOTOCURABLE COMPOSITION, CURED PRODUCT THEREOF, AND OPTICAL MATERIAL CONTAINING SAID CURED PRODUCT MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2024-03-14 US disclosed
EP-4282903-A1 PHOTOCURABLE COMPOSITION, CURED PRODUCT THEREOF, AND OPTICAL MATERIAL CONTAINING SAID CURED PRODUCT MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-11-29 EP disclosed
CN-116829989-A Photocurable composition, cured product thereof, and optical material containing the cured product 三菱瓦斯化学株式会社 2023-09-29 CN disclosed
WO-2022158324-A1 PHOTOCURABLE COMPOSITION, CURED PRODUCT THEREOF, AND OPTICAL MATERIAL CONTAINING SAID CURED PRODUCT 三菱瓦斯化学株式会社 2022-07-28 WO disclosed
CN-107735429-B Photocurable composition and optical material 三菱瓦斯化学株式会社 2021-05-07 CN disclosed
US-10647819-B2 Photocurable composition and optical material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2020-05-12 US disclosed
US-20180265638-A1 PHOTOCURABLE COMPOSITION AND OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2018-09-20 US disclosed
CN-107735429-A Photocurable composition and optical material 三菱瓦斯化学株式会社 2018-02-23 CN disclosed
CN-103562273-B9 Solidification compound and optics caking agent MITSUBISHI GAS CHEMICAL CO.,INC. (JP) 2016-06-01 CN disclosed
CN-103562273-B Solidification compound and optics caking agent MITSUBISHI GAS CHEMICAL CO.,INC. (JP) 2016-03-02 CN disclosed
CN-103562269-B Curable composition and optical adhesive MITSUBISHI GAS CHEMICAL CO 2015-07-08 CN disclosed
CN-103562272-B Curable composition and adhesive for optical applications MITSUBISHI GAS CHEMICAL CO 2015-07-08 CN disclosed
CN-103562269-A Curable composition and optical adhesive MITSUBISHI GAS CHEMICAL CO 2014-02-05 CN disclosed
CN-103562272-A Curable composition and adhesive for optical applications MITSUBISHI GAS CHEMICAL CO 2014-02-05 CN disclosed
CN-103562273-A Curable composition and adhesive for optics MITSUBISHI GAS CHEMICAL CO 2014-02-05 CN disclosed
EP-0785194-B1 Episulfide compound MITSUBISHI GAS CHEMICAL CO (JP) 2002-07-17 EP disclosed
US-5945504-A Episulfide compound MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1999-08-31 US disclosed
EP-0785194-A1 Episulfide compound MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1997-07-23 EP disclosed