Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADH1A | P07327 | 9/20 | 0.42 |
| ▸ | ADH1C | P00326 | 7/20 | 0.42 |
| ▸ | ADH4 | P08319 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | PHGDH | O43175 | 2/20 | 0.35 |
| ▸ | ADH1B | P00325 | 1/20 | 0.32 |
| ▸ | FDPS | P14324 | 1/20 | 0.32 |
| ▸ | FAAH | O00519 | 1/20 | 0.32 |
| ▸ | MGLL | Q99685 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19591971 | 0.96 | ADH1A (0.43) | ADH1AADH1CADH4ALDH1A1PHGDH | |
| SCHEMBL19592023 | 0.96 | ADH1A (0.43) | ADH1AADH1CADH4ALDH1A1PHGDH | |
| SCHEMBL19591979 | 0.96 | ADH1A (0.43) | ADH1AADH1CADH4ALDH1A1PHGDH | |
| SCHEMBL19591972 | 0.96 | ADH1A (0.43) | ADH1AADH1CADH4ALDH1A1PHGDH | |
| SCHEMBL97243 | 0.96 | ADH1A (0.43) | ADH1AADH1CADH4ALDH1A1PHGDH | |
| SCHEMBL11277355 | 0.96 | ADH1A (0.43) | ADH1AADH1CADH4ALDH1A1PHGDH | |
| SCHEMBL65968 | 0.96 | ADH1A (0.43) | ADH1AADH1CADH4ALDH1A1PHGDH | |
| SCHEMBL19997015 | 0.96 | ADH1A (0.43) | ADH1AADH1CADH4ALDH1A1PHGDH | |
| SCHEMBL21289754 | 0.96 | ADH1A (0.43) | ADH1AADH1CADH4ALDH1A1PHGDH | |
| SCHEMBL99438 | 0.96 | ADH1A (0.43) | ADH1AADH1CADH4ALDH1A1PHGDH |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1514 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4607278-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | Ycchem Co., Ltd. (KR) | 2025-08-27 | — | — | EP | claimed |
| US-20250199405-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | YCCHEM CO., LTD. (KR) | 2025-06-19 | — | — | US | claimed |
| CN-119998727-A | Chemically amplified positive resist composition for improving pattern profile and enhancing etch resistance | YC化学制品株式会社 | 2025-05-13 | — | — | CN | claimed |
| WO-2024085293-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | 영창케미칼 주식회사 | 2024-04-25 | — | — | WO | claimed |
| CN-110590844-A | Preparation method for synthesizing tenofovir alafenamide by two-step method | 江西农业大学 | 2019-12-20 | — | — | CN | claimed |
| CN-110551153-A | Preparation method for synthesizing tenofovir alafenamide by three-step method | UNIV JIANGXI AGRICULTURAL | 2019-12-10 | — | — | CN | claimed |
| US-10113049-B2 | Thermoplastic resin composition | NIPPON NYUKAZAI CO., LTD. (JP) | 2018-10-30 | — | — | US | claimed |
| US-9796800-B2 | Process for producing polydienes | BRIDGESTONE CORPORATION (JP) | 2017-10-24 | — | — | US | claimed |
| US-9371347-B2 | dppf-like compounds and method of manufacture and use | BROWN UNIVERSITY (US) | 2016-06-21 | — | — | US | claimed |
| US-20160108153-A1 | PROCESS FOR PRODUCING POLYDIENES | BRIDGESTONE CORPORATION (JP) | 2016-04-21 | — | — | US | claimed |
| WO-2012040026-A1 | PROCESS FOR PRODUCING POLYDIENES | BRIDGESTONE CORPORATION (JP) | 2012-03-29 | — | — | WO | claimed |
| US-7727707-B2 | Barrier film material and pattern formation method using the same | PANASONIC CORPORATION (JP) | 2010-06-01 | — | — | US | claimed |
| US-7135273-B2 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2006-11-14 | — | — | US | claimed |
| US-20060127812-A1 | Barrier film material and pattern formation method using the same | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2006-06-15 | — | — | US | claimed |
| EP-1669804-A2 | Barrier film material and pattern formation method using the same | Matsushita Electric Industries Co., Ltd. (JP) | 2006-06-14 | — | — | EP | claimed |
| WO-2005100020-A2 | PRIMER-LESS ABRASION COATING FOR ORGANIC GLASS ARTICLES | VISION-EASE LENS (US) | 2005-10-27 | — | — | WO | claimed |
| US-20050238882-A1 | Primer-less abrasion coating for organic glass articles | VISION-EASE LENS | 2005-10-27 | — | — | US | claimed |
| CN-1574218-A | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 2005-02-02 | — | — | CN | claimed |
| US-20040259040-A1 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-12-23 | — | — | US | claimed |
| US-4759861-A | Consists of an aliphatic mono- or di-carboxylic acid, a dimer or trimer of said dicarboxylic acid, petroleum sulfonic acid and naphthenic acid or salt | NIPPON OIL CO., LTD. (JP) | 1988-07-26 | — | — | US | claimed |