⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28184310 | 0.80 | — | — | |
| SCHEMBL14190799 | 0.80 | — | — | |
| SCHEMBL17449682 | 0.79 | CA12 (0.40) | — | |
| SCHEMBL28130254 | 0.79 | — | — | |
| SCHEMBL819835 | 0.78 | — | — | |
| SCHEMBL28866382 | 0.78 | — | — | |
| SCHEMBL31235684 | 0.76 | — | — | |
| SCHEMBL5313923 | 0.76 | ANPEP (0.43) | — | |
| SCHEMBL10621116 | 0.76 | — | — | |
| SCHEMBL1408757 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20050089489-A1 | Composition for exfoliation agent effective in removing resist residues | EKC TECHNOLOGY, INC. | 2005-04-28 | — | — | US | disclosed |
| US-6162575-A | Process for making lithographic printing plate | MITSUBISHI PAPER MILLS LIMITED (JP) | 2000-12-19 | — | — | US | disclosed |