SCHEMBL64101

SCHEMBL64101

CCCC(O)=CO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1093080 1.00
SCHEMBL3471045 0.81
SCHEMBL61709 0.81
SCHEMBL3122384 0.79
SCHEMBL3122377 0.79
SCHEMBL6678271 0.77 GPR84 (0.50)
SCHEMBL5367892 0.77 GPR84 (0.50)
SCHEMBL19946361 0.77 GPR84 (0.50)
SCHEMBL6678274 0.77 GPR84 (0.50)
SCHEMBL5367890 0.77 GPR84 (0.50)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023066502-A1 WATER REDUCED COMPACT CONDITIONER COMPOSITION WELLA GERMANY GMBH (DE) 2023-04-27 WO claimed
WO-2023067173-A1 WATER REDUCED COMPACT CONDITIONER COMPOSITION WELLA GERMANY GMBH (DE) 2023-04-27 WO claimed
US-11998517-B2 Antimicrobial composition ROTTAPHARM SPA (IT) 2024-06-04 US disclosed
WO-2023067173-A1 WATER REDUCED COMPACT CONDITIONER COMPOSITION WELLA GERMANY GMBH (DE) 2023-04-27 WO disclosed
US-20210121424-A1 ANTIMICROBIAL COMPOSITION ROTTAPHARM SPA (IT) 2021-04-29 US disclosed
US-10912747-B2 Antimicrobial composition ROTTAPHARM SPA 2021-02-09 US disclosed
US-20190247341-A1 ANTIMICROBIAL COMPOSITION ROTTAPHARM SPA (IT) 2019-08-15 US disclosed
EP-3292758-A1 ANTIMICROBIAL COMPOSITION COMPRISING A CARBOXYLIC ACID AND TWO DIOLS Rottapharm S.p.A. (IT) 2018-03-14 EP disclosed
US-8129523-B2 Coupling process for generating reactive boron-containing derivatives of N-substituted pyrrole-2-carbonitriles to produce biaryls WYETH LLC (US) 2012-03-06 US disclosed
US-7670418-B2 Yellow ink composition, inkset for inkjet, inkjet recording method, and recorded matter SEIKO EPSON CORPORATION (JP) 2010-03-02 US disclosed
US-20090054663-A1 COUPLING PROCESS FOR GENERATING REACTIVE BORON-CONTAINING DERIVATIVES OF N-SUBSTITUTED PYRROLE-2-CARBONITRILES TO PRODUCE BIARYLS WYETH (US) 2009-02-26 US disclosed
US-7446211-B2 Reacting 1-methylpyrrole-2-carbonitrile with triisopropylborate in presence of lithium diisopropyl amine to produce (5-cyano-1-methyl-1H-pyrrol-2-yl) boronic acid WYETH (US) 2008-11-04 US disclosed
US-20080233362-A1 Yellow ink composition, inkset for inkjet, inkjet recording method, and recorded matter SEIKO EPSON CORPORATION 2008-09-25 US disclosed
WO-2008036049-A1 PROCESS FOR PRODUCTION OF HIGH MOLECULAR WEIGHT POLYHYDROXY ACID HYFLUX LTD (SG) 2008-03-27 WO disclosed
US-20060241226-A1 GAP-FILLING CYANOACRYLATE ADHESIVE HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (HENKEL KGAA) (DE) 2006-10-26 US disclosed
US-20050272702-A1 Coupling process for generating reactive boron-containing derivatives of N-substituted pyrrole-2-carbonitriles to produce biaryls WYETH (US) 2005-12-08 US disclosed
WO-2005105817-A2 COUPLING PROCESS FOR GENERATING REACTIVE BORON­ CONTAINING DERIVATIVES OF N-SUBSTITUTED PYRROLE-2­ CARBONITRILES TO PRODUCE BIARYLS WYETH (US) 2005-11-10 WO disclosed