SCHEMBL6412092

SCHEMBL6412092

CC(=CN=C=O)CCCN=C=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1071973 0.88
SCHEMBL1071975 0.88
SCHEMBL9304846 0.77
SCHEMBL9294234 0.73
SCHEMBL6151090 0.72
SCHEMBL3898014 0.72
SCHEMBL11337018 0.70
SCHEMBL11337022 0.70
SCHEMBL11340062 0.70
SCHEMBL10720668 0.68

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118271558-A Improved preparation technology of high-purity alkyl hydrazine polyurethane material 东力(南通)化工有限公司 2024-07-02 CN claimed
US-6492482-B2 WEAR AND CHEMICAL RESISTANCE DEGUSS-HUELS AKTIENGESELLSCHAFT (DE) 2002-12-10 US claimed
CN-118271558-A Improved preparation technology of high-purity alkyl hydrazine polyurethane material 东力(南通)化工有限公司 2024-07-02 CN disclosed
CN-111164122-B Low viscosity polyols for polyurethane applications 斯蒂潘公司 2022-01-04 CN disclosed
CN-107057011-B Anti-aging and low-emission mattress and/or cushion 赢创运营有限公司 2021-07-02 CN disclosed
CN-107787340-B Production of low emission polyurethanes 赢创运营有限公司 2021-03-02 CN disclosed
CN-106574032-B Nitrogen-containing compounds suitable for the manufacture of polyurethanes 赢创运营有限公司 2020-07-21 CN disclosed
CN-111164122-A Low viscosity polyols for polyurethane applications 斯蒂潘公司 2020-05-15 CN disclosed
CN-107787340-A The production of low emission polyurethane 赢创德固赛有限公司 2018-03-09 CN disclosed
CN-107057011-A The mattress and/or cushion of anti-aging and low emission 赢创德固赛有限公司 2017-08-18 CN disclosed
CN-106574032-A Nitrogen-containing compounds suitable for use in the production of polyurethanes 赢创德固赛有限公司 2017-04-19 CN disclosed
CN-103477172-B Comprise the dynamic vaccum-pumping equipment of organic aerogel or xerogel BASF SE (DE) 2016-11-30 CN disclosed
CN-101119756-A Absorbent structure with improved water-absorbing material PROCTER & GAMBLE (US) 2008-02-06 CN disclosed
CN-101115508-A Absorbent structure with improved water-absorbing material PROCTER & GAMBLE (US) 2008-01-30 CN disclosed
US-20050010011-A1 NCO compounds with covalently bonded polyhedral oligomeric silicon-oxygen cluster units DEGUSSA AG (DE) 2005-01-13 US disclosed
US-20030027921-A1 Nonaqueous thermosetting two-component coating composition DEGUSSA AG (DE) 2003-02-06 US disclosed
US-6274759-B1 POLYURETHANE FOAMS BASF AKTIENGESELLSCHAFT (DE) 2001-08-14 US disclosed
EP-0864927-B1 Water-developable photosensitive resin composition JSR CORP (JP) 2000-12-27 EP disclosed
US-6140017-A LIGHT SENSITIVE POLYMERS FROM ALIPHATIC CONJUGATED DIENES WITH UNSATURATED MONOMER AND BLOCK COPOLYMERS WITH SULFONATE GROUPS PARTICULATE COPOLYMER (1) HAS AT LEAST ONE FUNCTIONAL GROUP SELECTED FROM THE GROUP CONSISTING OF CARBOXYL JSR CORPORATION (JP) 2000-10-31 US disclosed
EP-0864927-A1 Water-developable photosensitive resin composition JSR Corporation (JP) 1998-09-16 EP disclosed