SCHEMBL6419262

SCHEMBL6419262

C/C(=C\C1CC2CC1C1CCCC21)C(=O)O

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 1/20 0.34
RAB9A P51151 1/20 0.34
NPSR1 Q6W5P4 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
MAPT P10636 3/20 0.33
ALDH1A1 P00352 3/20 0.33
CA12 O43570 2/20 0.33
GMNN O75496 2/20 0.33
CA1 P00915 2/20 0.33
CA2 P00918 2/20 0.33
LMNA P02545 2/20 0.33
BLM P54132 2/20 0.33
CA9 Q16790 2/20 0.33
TDP1 Q9NUW8 2/20 0.33
SGMS1 Q86VZ5 1/20 0.33
SGMS2 Q8NHU3 1/20 0.33
TSHR P16473 2/20 0.32
KDM4E B2RXH2 1/20 0.32
MEN1 O00255 1/20 0.32
TP53 P04637 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6419264 1.00 NPC1 (0.34) NPC1RAB9ANPSR1L3MBTL1MAPT
SCHEMBL5669642 0.89 ALDH1A1 (0.30) ALDH1A1
SCHEMBL30621203 0.83 NPC1 (0.40) NPC1RAB9ANPSR1L3MBTL1MAPT
SCHEMBL10813891 0.76 ALDH1A1 (0.32) ALDH1A1TSHRGABRA1GABRG2RXRA
SCHEMBL1214959 0.76 ALDH1A1 (0.32) ALDH1A1TSHRGABRA1GABRG2RXRA
SCHEMBL711326 0.74 MAPT (0.36) NPC1RAB9ANPSR1L3MBTL1MAPT
SCHEMBL31468234 0.74 MAPT (0.36) NPC1RAB9ANPSR1L3MBTL1MAPT
SCHEMBL30362275 0.72 NPC1 (0.35) NPC1RAB9ANPSR1L3MBTL1MAPT
SCHEMBL22471939 0.72 ALDH1A1 (0.32) ALDH1A1TSHRGABRA1GABRG2RXRA
SCHEMBL22471937 0.72 ALDH1A1 (0.32) ALDH1A1TSHRGABRA1GABRG2RXRA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0590573-B1 Resin for plastic lens HITACHI CHEMICAL CO LTD (JP) 1998-01-07 EP claimed
EP-0241900-B1 OPTICAL DISK SUBSTRATE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1991-07-03 EP claimed
US-9377686-B2 Photosensitive resin composition, conductive wire protection film, and touch panel member TORAY INDUSTRIES, INC. (JP) 2016-06-28 US disclosed
US-20160179004-A1 PHOTOSENSITIVE POLYSILOXANE COMPOSITION, PROTECTING FILM, AND ELEMENT HAVING PROTECTIVE FILM CHI MEI CORPORATION (TW) 2016-06-23 US disclosed
US-20160054616-A1 ARRAY SUBSTRATE, LIQUID CRYSTAL DISPLAY ELEMENT, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2016-02-25 US disclosed
US-6893795-B2 Multilayer; water insoluble polymer and heat sensitive element on hydrophilic support; surfactant mixture FUJI PHOTO FILM CO., LTD. (JP) 2005-05-17 US disclosed