SCHEMBL6422760

SCHEMBL6422760

CCC[SiH2][SiH2]CCCCl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6420524 0.83 TSHR (0.60)
SCHEMBL6419843 0.83 TSHR (0.60)
SCHEMBL8382190 0.77
SCHEMBL8385676 0.70 TSHR (0.46)
Butyl Chloride SCHEMBL9430994 0.70
SCHEMBL23700996 0.69
Butyl Chloride SCHEMBL11601537 0.67
Butyl Chloride SCHEMBL10720283 0.67
SCHEMBL8384635 0.67 TSHR (0.50)
Hydrochloric Acid SCHEMBL1128248 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6946537-B2 Siloxane oligomers, a process for their production and their use DEGUSSA AG (DE) 2005-09-20 US disclosed
US-20040158090-A1 Siloxane oligomers, a process for their production and their use EVONIK DEGUSSA GMBH (DE) 2004-08-12 US disclosed
US-20030018155-A1 Siloxane oligomers, a process for their production and their use DEGUSSA AG (DE) 2003-01-23 US disclosed