SCHEMBL6427459

SCHEMBL6427459

O=C(CCC(=O)c1ccc(O)cc1O)c1ccc(O)cc1O

nearest known ligand 0.72

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSP90AB1 P08238 1/20 0.70
HTT P42858 2/20 0.70
ESR1 P03372 1/20 0.66
SHBG P04278 1/20 0.66
ESR2 Q92731 1/20 0.66
CES2 O00748 1/20 0.64
ALDH1A1 P00352 5/20 0.61
CA12 O43570 3/20 0.61
CA1 P00915 3/20 0.61
CA2 P00918 3/20 0.61
CA7 P43166 3/20 0.61
CA9 Q16790 3/20 0.61
CA14 Q9ULX7 3/20 0.61
TSHR P16473 2/20 0.61
GFER P55789 1/20 0.59
LMNA P02545 3/20 0.58
RAB9A P51151 3/20 0.58
SMN1; SMN2 Q16637 2/20 0.58
NPC1 O15118 2/20 0.58
MAPT P10636 2/20 0.58

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1134290 0.92 HTT (0.62) HSP90AB1HTTESR1SHBGESR2
SCHEMBL10350385 0.91 HTT (0.83) HSP90AB1HTTESR1SHBGESR2
SCHEMBL9816216 0.90 HTT (0.65) HSP90AB1HTTESR1SHBGESR2
SCHEMBL7775763 0.90 HTT (0.80) HSP90AB1HTTESR1SHBGESR2
SCHEMBL7775791 0.90 HTT (0.80) HSP90AB1HTTESR1SHBGESR2
SCHEMBL7769588 0.90 HTT (0.80) HSP90AB1HTTESR1SHBGESR2
SCHEMBL12896564 0.90 HTT (0.80) HSP90AB1HTTESR1SHBGESR2
SCHEMBL7773876 0.90 HTT (0.80) HSP90AB1HTTESR1SHBGESR2
SCHEMBL3662473 0.88 HTT (0.77) HSP90AB1HTTESR1SHBGESR2
SCHEMBL16377932 0.88 HTT (0.62) HSP90AB1HTTESR1SHBGESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1604647-A1 Cosmetic composition containing polyorganosiloxane-containing epsilon-polylysine polymer, and polyhydric alcohol, and production thereof Ichimaru Pharcos Co., Ltd. (JP) 2005-12-14 EP disclosed
EP-0445819-A2 Positive type photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1991-09-11 EP disclosed
US-4628020-A Light-sensitive compound mixture and copying material comprising o-naphthquinonediazide compound HOECHST AKTIENGESELLSCHAFT (DE) 1986-12-09 US disclosed
EP-0056092-A1 Light sensitive composition based on o-naphtoquinone diazides and light sensitive copying material produced therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1982-07-21 EP disclosed