SCHEMBL6437809

SCHEMBL6437809

CCCCCCCCNC(=O)c1cc(C(=O)NCCCCCCCC)cc(C(=O)NCCCCCCCC)c1

nearest known ligand 0.71

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 4/20 0.71
L3MBTL1 Q9Y468 1/20 0.69
SMN1; SMN2 Q16637 2/20 0.68
MLYCD O95822 1/20 0.61
CA2 P00918 1/20 0.59
EPHX1 P07099 4/20 0.57
MEN1 O00255 2/20 0.57
KMT2A Q03164 2/20 0.57
THRA P10827 1/20 0.56
THRB P10828 1/20 0.56
GPR84 Q9NQS5 1/20 0.55
ALDH1A1 P00352 1/20 0.55
MAPT P10636 1/20 0.55

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9979317 1.00 NAAA (0.71) NAAAL3MBTL1SMN1; SMN2MLYCDCA2
SCHEMBL1977288 1.00 NAAA (0.71) NAAAL3MBTL1SMN1; SMN2MLYCDCA2
SCHEMBL19326796 1.00 NAAA (0.71) NAAAL3MBTL1SMN1; SMN2MLYCDCA2
SCHEMBL9978782 1.00 NAAA (0.71) NAAAL3MBTL1SMN1; SMN2MLYCDCA2
SCHEMBL19326794 1.00 NAAA (0.71) NAAAL3MBTL1SMN1; SMN2MLYCDCA2
SCHEMBL1978767 1.00 NAAA (0.71) NAAAL3MBTL1SMN1; SMN2MLYCDCA2
SCHEMBL9979011 1.00 NAAA (0.71) NAAAL3MBTL1SMN1; SMN2MLYCDCA2
SCHEMBL9979205 0.98 SMN1; SMN2 (0.70) NAAAL3MBTL1SMN1; SMN2MLYCDCA2
SCHEMBL19288364 0.93 NAAA (0.63) NAAAL3MBTL1SMN1; SMN2MLYCDCA2
SCHEMBL17373856 0.93 NAAA (0.68) NAAAL3MBTL1SMN1; SMN2MLYCDCA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119978402-A Organic ferroelectric material with adjustable polarization property and preparation method and application thereof 中国科学院深圳先进技术研究院 2025-05-13 CN disclosed
US-8492468-B2 Polypropylene resin composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-07-23 US disclosed
US-8415416-B2 Electret materials BASF SE (DE) 2013-04-09 US disclosed
US-8415416-B2 Electret materials BASF SE (DE) 2013-04-09 US disclosed
US-20130012091-A1 Electret Materials BASF SE (DE) 2013-01-10 US disclosed
US-20130012091-A1 Electret Materials BASF SE (DE) 2013-01-10 US disclosed
US-20120184170-A1 Electret Materials CHIN HUI (US) 2012-07-19 US disclosed
US-20120184170-A1 Electret Materials CHIN HUI (US) 2012-07-19 US disclosed
US-20110301268-A1 POLYPROPYLENE RESIN COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-12-08 US disclosed
US-20110230109-A1 Electret Materials CHIN HUI 2011-09-22 US disclosed
US-20110230109-A1 Electret Materials CHIN HUI 2011-09-22 US disclosed
WO-2008122525-A1 ELECTRET MATERIALS BASF SE (CH) 2008-10-16 WO disclosed
US-20080249269-A1 Electret materials CIBA CORP. 2008-10-09 US disclosed
US-20080249269-A1 Electret materials CIBA CORP. 2008-10-09 US disclosed
US-20050077648-A1 Solution casting method and polymer film FUJIFILM CORPORATION (JP) 2005-04-14 US disclosed