Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 5/20 | 0.40 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.40 |
| ▸ | SPHK1 | Q9NYA1 | 2/20 | 0.40 |
| ▸ | GMNN | O75496 | 1/20 | 0.40 |
| ▸ | POLB | P06746 | 1/20 | 0.40 |
| ▸ | THPO | P40225 | 1/20 | 0.40 |
| ▸ | MTOR | P42345 | 1/20 | 0.40 |
| ▸ | BLM | P54132 | 1/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | TP53 | P04637 | 1/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.40 |
| ▸ | CETP | P11597 | 1/20 | 0.40 |
| ▸ | HTT | P42858 | 1/20 | 0.40 |
| ▸ | UBE2N | P61088 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3630693 | 0.92 | PTPN1 (0.39) | SMN1; SMN2LMNACYP2D6SPHK1GMNN | |
| SCHEMBL3399170 | 0.86 | TRPV1 (0.41) | SMN1; SMN2LMNACYP2D6SPHK1GMNN | |
| SCHEMBL3174122 | 0.85 | LMNA (0.38) | SMN1; SMN2LMNACYP2D6SPHK1GMNN | |
| SCHEMBL28277801 | 0.84 | SMN1; SMN2 (0.48) | SMN1; SMN2LMNACYP2D6SPHK1GMNN | |
| SCHEMBL24176357 | 0.83 | TRPV1 (0.46) | SMN1; SMN2LMNACYP2D6SPHK1GMNN | |
| SCHEMBL1790073 | 0.83 | TRPV1 (0.39) | SMN1; SMN2LMNACYP2D6SPHK1GMNN | |
| SCHEMBL21552377 | 0.83 | TRPV1 (0.46) | SMN1; SMN2LMNACYP2D6SPHK1GMNN | |
| SCHEMBL21552219 | 0.83 | TRPV1 (0.46) | SMN1; SMN2LMNACYP2D6SPHK1GMNN | |
| SCHEMBL8503320 | 0.83 | TRPV1 (0.46) | SMN1; SMN2LMNACYP2D6SPHK1GMNN | |
| SCHEMBL4006613 | 0.83 | TRPV1 (0.46) | SMN1; SMN2LMNACYP2D6SPHK1GMNN |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116660543-A | Diagnostic and prognostic markers for nonalcoholic fatty liver disease and uses thereof | 中国人民解放军陆军军医大学第一附属医院 | 2023-08-29 | — | — | CN | claimed |
| US-9188866-B2 | Composition for forming titanium-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-11-17 | — | — | US | disclosed |
| US-9176382-B2 | Composition for forming titanium-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-11-03 | — | — | US | disclosed |
| US-9176382-B2 | Composition for forming titanium-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-11-03 | — | — | US | disclosed |
| US-20140273447-A1 | COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-18 | — | — | US | disclosed |
| US-20140273447-A1 | COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-18 | — | — | US | disclosed |
| US-20140273448-A1 | COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-18 | — | — | US | disclosed |
| US-20140273448-A1 | COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-18 | — | — | US | disclosed |
| EP-1172400-B1 | THERMOPLASTIC RESIN FILM WITH SATISFACTORY PRINTABILITY | YUPO CORP (JP) | 2005-12-28 | — | — | EP | disclosed |
| US-6586106-B2 | Ink transfer, adhesion and aging stability, and being satisfactory in back ghost when offset printing using oxidation polymerization type ink is performed on both faces | YUPO CORPORATION (JP) | 2003-07-01 | — | — | US | disclosed |
| US-20020054991-A1 | Thermoplastic resin film satisfactory in printability | YUPO CORPORATION (JP) | 2002-05-09 | — | — | US | disclosed |
| EP-1172400-A1 | THERMOPLASTIC RESIN FILM WITH SATISFACTORY PRINTABILITY | Yupo Corporation (JP) | 2002-01-16 | — | — | EP | disclosed |