SCHEMBL6439353

SCHEMBL6439353

Cc1ccc2c(c1)[C](CC[C]1C=Cc3ccc(C)cc31)C=C2

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOA P21397 1/20 0.34
MAOB P27338 1/20 0.34
CYP1A2 P05177 2/20 0.33
CYP2A6 P11509 2/20 0.33
ELANE P08246 1/20 0.33
TAAR1 Q96RJ0 1/20 0.32
ROS1 P08922 1/20 0.32
CDK5 Q00535 1/20 0.32
ACVR1 Q04771 1/20 0.32
LRRK2 Q5S007 1/20 0.32
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
CA4 P22748 1/20 0.31
CA7 P43166 1/20 0.31
CA9 Q16790 1/20 0.31
TP53 P04637 1/20 0.30
CYP3A4 P08684 1/20 0.30
THRB P10828 1/20 0.30
ALOX15 P16050 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4611979 0.83 MAOA (0.34) MAOAMAOBCYP1A2CYP2A6ELANE
SCHEMBL28676388 0.73 MAOA (0.37) MAOAMAOBCYP1A2CYP2A6ELANE
SCHEMBL13967835 0.71 CA1 (0.45) MAOAMAOBCYP1A2CYP2A6ELANE
SCHEMBL714162 0.71 TDP1 (0.43) MAOAMAOBCYP1A2CYP2A6ELANE
SCHEMBL27862645 0.69 TDP1 (0.42) MAOAMAOBCYP1A2CYP2A6ELANE
SCHEMBL29174119 0.69 TDP1 (0.42) MAOAMAOBCYP1A2CYP2A6ELANE
SCHEMBL28302268 0.69 TDP1 (0.42) MAOAMAOBCYP1A2CYP2A6ELANE
SCHEMBL28680694 0.68 MAOA (0.33) MAOAMAOBCYP1A2CYP2A6ELANE
SCHEMBL7793893 0.68
SCHEMBL28675744 0.67 MEN1 (0.33) MAOAMAOBCYP1A2CYP2A6ELANE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6894120-B2 Ethylene copolymer composition MITSUI CHEMICALS, INC. (JP) 2005-05-17 US disclosed
US-20040210004-A1 Ethylene copolymer composition TAKAHASHI MAMORU (JP) 2004-10-21 US disclosed
US-6774190-B1 LOW DENSITY POLYETHYLENE OBTAINED BY HIGH-PRESSURE FREE RADICAL POLYMERIZATION; HEAT RESISTANCE, STABILITY, MOLDABILITY, AND TRANSPARENCY; ANTI-BLOCKING RESISTANCE MITSUI CHEMICALS, INC. (JP) 2004-08-10 US disclosed
US-20030092845-A1 Ethylene copolymer composition TAKAHASHI MAMORU (JP) 2003-05-15 US disclosed
US-20020143126-A1 Ethylene resin injection molded articles TAKAHASHI MAMORU (JP) 2002-10-03 US disclosed
US-6319961-B1 ETHYLENE/ALPHA-OLEFIN COPOLYMER; DENSITY IS 0.880-0.940 G/CM3; MELT FLOW RATE AT 190 DEGREES C. UNDER A 2.16 KG LOAD IS 0.1-20 G/10 MIN MITSUI CHEMICALS INC (JP) 2001-11-20 US disclosed
US-5674945-A Ethylene copolymer composition MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1997-10-07 US disclosed
EP-0587365-B1 Ethylene copolymer composition MITSUI PETROCHEMICAL IND (JP) 1997-04-23 EP disclosed
US-5594071-A HEAT RESISTANCE, MOLDABILITY MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1997-01-14 US disclosed
EP-0587365-A2 Ethylene copolymer composition MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1994-03-16 EP disclosed