⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14085977 | 0.92 | — | — | |
| SCHEMBL6526666 | 0.90 | — | — | |
| SCHEMBL14085975 | 0.82 | — | — | |
| SCHEMBL5844557 | 0.75 | — | — | |
| SCHEMBL1760755 | 0.74 | SMN1; SMN2 (0.32) | — | |
| SCHEMBL4827981 | 0.72 | ALDH1A1 (0.32) | — | |
| SCHEMBL21839068 | 0.72 | — | — | |
| SCHEMBL18091021 | 0.72 | — | — | |
| SCHEMBL16970940 | 0.72 | SMN1; SMN2 (0.30) | — | |
| SCHEMBL2616357 | 0.72 | CES1 (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 233 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260086458-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AND POLYMER COMPOUND | TOKYO OHKA KOGYO CO LTD (JP) | 2026-03-26 | — | — | US | disclosed |
| US-20260086457-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD | TOKYO OHKA KOGYO CO LTD (JP) | 2026-03-26 | — | — | US | disclosed |
| US-20260079395-A1 | RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND AND ACID DIFFUSION CONTROL AGENT | TOKYO OHKA KOGYO CO LTD (JP) | 2026-03-19 | — | — | US | disclosed |
| US-20260079394-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND AND ACID DIFFUSION CONTROL AGENT | TOKYO OHKA KOGYO CO LTD (JP) | 2026-03-19 | — | — | US | disclosed |
| EP-4707928-A1 | COMPOSITION FOR FORMING SURFACE-MODIFIED LAYER, AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-03-11 | — | — | EP | disclosed |
| US-12566376-B2 | Resist composition and resist pattern forming method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-03-03 | — | — | US | disclosed |
| US-20260050211-A1 | RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND INTERMEDIATE THEREOF | TOKYO OHKA KOGYO CO LTD (JP) | 2026-02-19 | — | — | US | disclosed |
| US-20250390017-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID GENERATION AGENT | TOKYO OHKA KOGYO CO LTD (JP) | 2025-12-25 | — | — | US | disclosed |
| US-12498635-B2 | Resist composition, method of forming resist pattern, and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-12-16 | — | — | US | disclosed |
| US-20250355354-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO LTD (JP) | 2025-11-20 | — | — | US | disclosed |
| US-20070161764-A1 | Novel thiol compound, copolymer and method for producing the copolymer | YAMAGISHI TAKANORI | 2007-07-12 | — | — | US | disclosed |
| US-20070161764-A1 | Novel thiol compound, copolymer and method for producing the copolymer | YAMAGISHI TAKANORI | 2007-07-12 | — | — | US | disclosed |
| US-7220808-B2 | Thiol compound, copolymer and method for producing the copolymer | MARUZEN PETROCHEMICAL CO. LTD. (JP) | 2007-05-22 | — | — | US | disclosed |
| US-7220808-B2 | Thiol compound, copolymer and method for producing the copolymer | MARUZEN PETROCHEMICAL CO. LTD. (JP) | 2007-05-22 | — | — | US | disclosed |
| US-20070111137-A1 | Resist polymer solution and process for producing the same | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2007-05-17 | — | — | US | disclosed |
| US-20070065748-A1 | Resin for photoresist composition, photoresist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-03-22 | — | — | US | disclosed |
| US-20070065748-A1 | Resin for photoresist composition, photoresist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-03-22 | — | — | US | disclosed |
| US-7045582-B2 | Preparation process of copolymer for semiconductor lithography and a copolymer for semiconductor lithography available by this process | MARUZEN PETROCHEMICAL CO. LTD. (JP) | 2006-05-16 | — | — | US | disclosed |
| US-20050131184-A1 | Preparation process of copolymer for semiconductor lithography and a copolymer for semiconductor lithography available by this process | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2005-06-16 | — | — | US | disclosed |
| US-20050096447-A1 | Production process of copolymer for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2005-05-05 | — | — | US | disclosed |