⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27419690 | 0.73 | TET2 (0.33) | — | |
| SCHEMBL10359858 | 0.70 | — | — | |
| SCHEMBL119053 | 0.70 | — | — | |
| SCHEMBL28251271 | 0.70 | — | — | |
| SCHEMBL28037098 | 0.67 | — | — | |
| SCHEMBL10336908 | 0.64 | — | — | |
| SCHEMBL168369 | 0.60 | — | — | |
| SCHEMBL26660986 | 0.60 | ALDH1A1 (0.46) | — | |
| SCHEMBL29255 | 0.60 | ALDH1A1 (0.46) | — | |
| SCHEMBL445370 | 0.60 | ALDH1A1 (0.46) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20030064154-A1 | Low-K dielectric thin films and chemical vapor deposition method of making same | ADVANCED TECHNOLOGY MATERIALS, INC. | 2003-04-03 | — | — | US | claimed |
| WO-2003015129-A2 | LOW-K DIELECTRIC THIN FILMS AND CHEMICAL VAPOR DEPOSITION METHOD OF MAKING SAME | ADVANCED TECHNOLOGY MATERIAL, INC. (US) | 2003-02-20 | — | — | WO | claimed |
| US-20020172766-A1 | Low dielectric constant thin films and chemical vapor deposition method of making same | ADVANCED TECHNOLOGY MATERIALS, INC. | 2002-11-21 | — | — | US | claimed |
| US-9069247-B2 | Silicon-containing surface modifier, resist lower layer film-forming composition containing the same, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-30 | — | — | US | disclosed |
| US-20130210229-A1 | SILICON-CONTAINING SURFACE MODIFIER, RESIST LOWER LAYER FILM-FORMING COMPOSITION CONTAINING THE SAME, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-15 | — | — | US | disclosed |
| US-20050038276-A1 | Low dielectric constant thin films and chemical vapor deposition method of making same | LAXMAN RAVI K (US) | 2005-02-17 | — | — | US | disclosed |
| US-20030064154-A1 | Low-K dielectric thin films and chemical vapor deposition method of making same | ADVANCED TECHNOLOGY MATERIALS, INC. | 2003-04-03 | — | — | US | disclosed |
| WO-2003015129-A2 | LOW-K DIELECTRIC THIN FILMS AND CHEMICAL VAPOR DEPOSITION METHOD OF MAKING SAME | ADVANCED TECHNOLOGY MATERIAL, INC. (US) | 2003-02-20 | — | — | WO | disclosed |
| US-20020172766-A1 | Low dielectric constant thin films and chemical vapor deposition method of making same | ADVANCED TECHNOLOGY MATERIALS, INC. | 2002-11-21 | — | — | US | disclosed |