Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL151938 | 0.89 | ALDH1A1 (0.33) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| SCHEMBL9854168 | 0.81 | TSHR (0.35) | TSHRALDH1A1 | |
| SCHEMBL489174 | 0.81 | TSHR (0.35) | TSHRALDH1A1 | |
| SCHEMBL3748655 | 0.80 | TSHR (0.47) | TSHRALDH1A1CYP3A4 | |
| SCHEMBL10456655 | 0.80 | TSHR (0.47) | TSHRALDH1A1CYP3A4 | |
| SCHEMBL64443 | 0.80 | TSHR (0.34) | TSHRALDH1A1 | |
| SCHEMBL1695953 | 0.80 | TSHR (0.34) | TSHRALDH1A1 | |
| SCHEMBL646489 | 0.80 | TSHR (0.55) | TSHRALDH1A1TP53CYP3A4MAPK1 | |
| SCHEMBL601419 | 0.79 | TSHR (0.38) | TSHRALDH1A1CYP3A4 | |
| SCHEMBL11434518 | 0.79 | TSHR (0.38) | TSHRALDH1A1CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3227396-B1 | RADIATION CURING COATING COMPOSITION | PERSTORP AB (SE) | 2019-06-26 | — | — | EP | claimed |
| US-10167359-B2 | Radiation curing coating composition | PERSTORP AB (SE) | 2019-01-01 | — | — | US | claimed |
| US-20170355807-A1 | RADIATION CURING COATING COMPOSITION | PERSTORP UK LTD (GB) | 2017-12-14 | — | — | US | claimed |
| EP-3227396-A1 | RADIATION CURING COATING COMPOSITION | Perstorp AB (SE) | 2017-10-11 | — | — | EP | claimed |
| WO-2016089271-A1 | RADIATION CURING COATING COMPOSITION | PERSTORP AB (SE) | 2016-06-09 | — | — | WO | claimed |
| US-8119331-B2 | Photopolymer composition usable for lithographic plates | KODAK GRAPHIC COMMUNICATIONS GMBH (DE) | 2012-02-21 | — | — | US | claimed |
| EP-1969426-B1 | PHOTOPOLYMER COMPOSITION SUITABLE FOR LITHOGRAPHIC PRINTING PLATES | KODAK GRAPHIC COMM GMBH (DE) | 2010-09-22 | — | — | EP | claimed |
| US-20090011363-A1 | Photopolymer Composition Usable for Lithographic Plates | BANK OF AMERICA, N.A., AS AGENT | 2009-01-08 | — | — | US | claimed |
| EP-1969426-A2 | PHOTOPOLYMER COMPOSITION SUITABLE FOR LITHOGRAPHIC PRINTING PLATES | Kodak Graphic Communications GmbH (DE) | 2008-09-17 | — | — | EP | claimed |
| WO-2007077207-A2 | PHOTOPOLYMER COMPOSITION SUITABLE FOR LITHOGRAPHIC PRINTING PLATES | KODAK GRAPHIC COMMUNICATIONS GMBH (DE) | 2007-07-12 | — | — | WO | claimed |
| EP-3263355-B1 | PLANOGRAPHIC PRINTING PLATE PRECURSOR, PLATE-MAKING METHOD FOR PLANOGRAPHIC PRINTING PLATE, AND PRINTING METHOD | FUJIFILM CORP (JP) | 2020-03-25 | — | — | EP | disclosed |
| EP-3227396-B1 | RADIATION CURING COATING COMPOSITION | PERSTORP AB (SE) | 2019-06-26 | — | — | EP | disclosed |
| US-10167359-B2 | Radiation curing coating composition | PERSTORP AB (SE) | 2019-01-01 | — | — | US | disclosed |
| US-20180009212-A1 | PLANOGRAPHIC PRINTING PLATE PRECURSOR, PLATE-MAKING METHOD FOR PLANOGRAPHIC PRINTING PLATE, AND PRINTING METHOD | FUJIFILM CORPORATION (JP) | 2018-01-11 | — | — | US | disclosed |
| EP-3263355-A1 | ORIGINAL PLATE OF PLANOGRAPHIC PRINTING PLATE, PLATE-MAKING METHOD FOR PLANOGRAPHIC PRINTING PLATE, AND PRINTING METHOD | FUJIFILM Corporation (JP) | 2018-01-03 | — | — | EP | disclosed |
| WO-2009109579-A1 | SENSITIZER/INITIATOR COMBINATION FOR NEGATIVE-WORKING THERMAL-SENSITIVE COMPOSITIONS USABLE FOR LITHOGRAPHIC PLATES | EASTMAN KODAK COMPANY (US) | 2009-09-11 | — | — | WO | disclosed |
| EP-2098367-A1 | Sensitizer/Initiator Combination for Negative-Working Thermal-Sensitive Compositions Usable for Lithographic Plates | EASTMAN KODAK COMPANY (US) | 2009-09-09 | — | — | EP | disclosed |
| US-20090011363-A1 | Photopolymer Composition Usable for Lithographic Plates | BANK OF AMERICA, N.A., AS AGENT | 2009-01-08 | — | — | US | disclosed |
| WO-2008058939-A2 | UV-SENSITIVE ELEMENTS WITH TRIARYLAMINE DERIVATIVES AS SENSITIZERS FOR CTP EXPOSURE | EASTMAN KODAK COMPANY (US) | 2008-05-22 | — | — | WO | disclosed |
| EP-1921500-A1 | UV-sensitive elements with triarylamine derivatives as sensitizers | EASTMAN KODAK COMPANY (US) | 2008-05-14 | — | — | EP | disclosed |