SCHEMBL6448877

SCHEMBL6448877

C=CC1(C2CCCCCCC2)CCCCCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10617836 1.00
SCHEMBL9063491 1.00
SCHEMBL11810974 0.84
SCHEMBL6586900 0.83
SCHEMBL29222418 0.78
SCHEMBL10531438 0.75
SCHEMBL10528742 0.75
SCHEMBL21457789 0.75 ADH1A (0.32)
SCHEMBL31476927 0.75 ADH1A (0.32)
SCHEMBL2653668 0.75 ADH1A (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1298491-B1 RESIST COMPOSITION ASAHI GLASS CO LTD (JP) 2005-02-09 EP disclosed
US-6733952-B2 A FLUORO-COPOLYMER COMPRISING A FLUOROVINYL ETHER MONOMER AND AN ALICYCLIC ETHYLENIC MONOMER, AND AN ACID-GENERATING ONIUM SALT UPON IRRADIATION WITH LIGHT; TRANSPARENCY, DRY ETCHING, PHOTOSENSITIVITY, RESOLUTION, UNIFORMITY, HEAT RESISTANCE ASAHI GLASS COMPANY, LIMITED (JP) 2004-05-11 US disclosed
US-20030130409-A1 A fluoro-copolymer comprising a fluorovinyl ether monomer and an alicyclic ethylenic monomer, and an acid-generating onium salt upon irradiation with light; transparency, dry etching, photosensitivity, resolution, uniformity, heat resistance ASAHI GLASS COMPANY LIMITED (JP) 2003-07-10 US disclosed
EP-1298491-A1 RESIST COMPOSITION ASAHI GLASS COMPANY LTD. (JP) 2003-04-02 EP disclosed