Ethylene Glycol

Ethylene Glycol

SCHEMBL6449088

OCCO.c1ccc(C2CO2)cc1

nearest known ligand 0.77

Full drug profile on Sugi Atlas →

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.77
CHRM2 P08172 5/20 0.51
CHRM3 P20309 4/20 0.51
CHRM4 P08173 3/20 0.51
CHRM1 P11229 3/20 0.51
ADRA2A P08913 3/20 0.47
ALDH1A1 P00352 1/20 0.46
ADRA1A P35348 2/20 0.45
SLC18A3 Q16572 1/20 0.44
HTR1A P08908 2/20 0.43
PARP1 P09874 1/20 0.43
ADRA1D P25100 1/20 0.43
SLC6A2 P23975 1/20 0.41
SLC6A4 P31645 1/20 0.41
SLC6A3 Q01959 1/20 0.41
CHRM5 P08912 3/20 0.41
MEN1 O00255 1/20 0.39
CYP2C19 P33261 1/20 0.39
KMT2A Q03164 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrogen Peroxide SCHEMBL28927927 0.91 TSHR (0.94) TSHRCHRM2CHRM3CHRM4CHRM1
Monoethanolamine SCHEMBL28516398 0.90 TSHR (0.68) TSHRCHRM2CHRM3CHRM4CHRM1
Alcohol SCHEMBL8767673 0.89 TSHR (0.74) TSHRCHRM2CHRM3CHRM4CHRM1
SCHEMBL28467238 0.88 TSHR (1.00) TSHRCHRM2CHRM3CHRM4CHRM1
SCHEMBL21026 0.88
SCHEMBL1943997 0.88
SCHEMBL987488 0.88
Methyl Alcohol SCHEMBL8766879 0.86 TSHR (0.85) TSHRCHRM2CHRM3CHRM4CHRM1
SCHEMBL4282078 0.85 TSHR (0.94) TSHRCHRM2CHRM3CHRM4CHRM1
SCHEMBL20981569 0.85 TSHR (0.94) TSHRCHRM2CHRM3CHRM4CHRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-3206002-A None JP disclosed
US-6899980-B2 Photomask material and process of producing photomask from the photomask material FUJI PHOTO FILM CO., LTD. (JP) 2005-05-31 US disclosed
US-20030091908-A1 Photomask material and process of producing photomask from the photomask material FUJI PHOTO FILM CO., LTD. (JP) 2003-05-15 US disclosed
US-6010995-A NONIONIC SURFACTANT HAVING CERTAIN SPECIFIED CHARACTERISTICS; AN OLIGOMERIC OR MONO/POLYFUNCTIONAL HYDROPHOBE HAVING CERTAIN SPECIFIED CHARACTERISTICS; AND WATER BUCKEYE INTERNATIONAL, INC. (US) 2000-01-04 US disclosed
US-5516813-A ROTORS STARKEY DONN R (US) 1996-05-14 US disclosed
US-5384339-A Quartz or silica radiation transparent filler, dynamic testing STARKEY DONN R (US) 1995-01-24 US disclosed
US-5124234-A Protective coating for printed circuits FUJI PHOTO FILM CO., LTD. (JP) 1992-06-23 US disclosed
JP-H03206002-A DISPERSING AGENT FOR SUSPENDED INSECTICIDE SANYO CHEM IND LTD 1991-09-09 JP disclosed
US-4948700-A PHOTOPOLYMERIZABLE COMPOSITION OF EPOXY NOVOLAKS, UNSATURATED ACIS, POLYBASIC ANHYDRIDES, UNSATURATED ETHYLENIC COMPOUNDS, EPOXY COMPONENTS; CURING, MASHING, PRINTED CIRCUITS FUJI PHOTO FILM CO., LTD. (JP) 1990-08-14 US disclosed