SCHEMBL645003

SCHEMBL645003

C=C(C)C(=O)OCCCOC(=O)c1ccccc1C(=O)OCCCOC(=O)C(=C)C

nearest known ligand 0.62

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TSHR P16473 9/20 0.62
TDP1 Q9NUW8 5/20 0.62
L3MBTL1 Q9Y468 2/20 0.62
CYP3A4 P08684 3/20 0.60
MAPK1 P28482 2/20 0.60
TP53 P04637 1/20 0.60
ALDH1A1 P00352 6/20 0.58
LMNA P02545 1/20 0.58
HSD17B10 Q99714 2/20 0.50
POLB P06746 2/20 0.49
APEX1 P27695 1/20 0.49
HTT P42858 1/20 0.49
KDM4E B2RXH2 1/20 0.48
PTGS2 P35354 1/20 0.44
THRB P10828 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2532109 0.97 TSHR (0.65) TSHRTDP1L3MBTL1CYP3A4MAPK1
SCHEMBL4805293 0.95 TSHR (0.66) TSHRTDP1L3MBTL1CYP3A4MAPK1
SCHEMBL11229934 0.95 TSHR (0.66) TSHRTDP1L3MBTL1CYP3A4MAPK1
SCHEMBL194453 0.94 TSHR (0.55) TSHRTDP1L3MBTL1CYP3A4MAPK1
SCHEMBL129437 0.93 TSHR (0.62) TSHRTDP1L3MBTL1CYP3A4MAPK1
SCHEMBL28304537 0.93 TSHR (0.54) TSHRTDP1L3MBTL1CYP3A4MAPK1
SCHEMBL28996621 0.92 TSHR (0.61) TSHRTDP1L3MBTL1CYP3A4MAPK1
SCHEMBL194750 0.91 TSHR (0.58) TSHRTDP1L3MBTL1CYP3A4MAPK1
SCHEMBL31304736 0.91 TSHR (0.55) TSHRTDP1L3MBTL1CYP3A4MAPK1
SCHEMBL17034392 0.91 TDP1 (0.73) TSHRTDP1L3MBTL1CYP3A4MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 265 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110233454-A1 ORGANIC POLYMER PARTICLES AND PROCESS FOR PRODUCING SAME JSR CORPORATION (JP) 2011-09-29 US claimed
US-7981512-B2 Organic polymer particles and magnetic particles used as reaction solid phase of a diagnostic agent; chemically bond to biological-related substances, proteins, antibody, antigen, by utilizing a carboxyl group; exhibit high detection sensitivity; detect infections, cancer markers, hormones JSR CORPORATION (JP) 2011-07-19 US claimed
US-20080078974-A1 ORGANIC POLYMER PARTICLES AND PROCESS FOR PRODUCING SAME JSR CORPORATION (JP) 2008-04-03 US claimed
US-20250155808-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN ZEON CORPORATION (JP) 2025-05-15 US disclosed
CN-113453416-B Laminate, method for producing printed wiring board, and printed wiring board 互应化学工业株式会社 2025-04-08 CN disclosed
CN-114449745-B Printed wiring board and method for manufacturing printed wiring board 互应化学工业株式会社 2025-01-07 CN disclosed
EP-4400223-A1 DIGITAL EMBOSSING CREATION METHOD Sakata INX Corporation (JP) 2024-07-17 EP disclosed
EP-4397726-A1 PHOTOCURABLE INK COMPOSITION FOR INKJET PRINTING Sakata INX Corporation (JP) 2024-07-10 EP disclosed
US-20240218195-A1 ELECTRON BEAM-CURABLE PRINTING INK COMPOSITION AND PRINTED MATTER OBTAINED BY PRINTING WITH ELECTRON BEAM-CURABLE PRINTING INK COMPOSITION SAKATA INX CORPORATION (JP) 2024-07-04 US disclosed
WO-2024122204-A1 ACTIVE ENERGY RAY-CURABLE INKJET INK, ACTIVE ENERGY RAY-CURABLE INK SET, AND IMAGE RECORDING METHOD 富士フイルム株式会社 2024-06-13 WO disclosed
CN-114509919-B Method for manufacturing interlayer insulating film and interlayer insulating film 互应化学工业株式会社 2024-06-07 CN disclosed
US-20020019461-A1 Radiation-curable metal particles and curable resin compositions comprising these particles JSR CORPORATION (JP) 2002-02-14 US disclosed
US-6160067-A Reactive silica particles, process for manufacturing the same, use of the same DSM N.V. (NL) 2000-12-12 US disclosed
US-6013749-A MIXTURE COMPRISING POLYFUNCTIONAL ACRYLATE ESTER COMPOUND, REACTION PRODUCT OF SILICA PARTICLES COUPLED TO ALKOXYSILANE COMPOUND CONTAINING THIO- OR DITHIOCARBAMATE MOIETIES, AND A SILICONE POLYMER; HARD PROTECTIVE COATINGS DSM N.V. (NL) 2000-01-11 US disclosed
EP-0877777-B1 REACTIVE SILICA PARTICLES, PROCESS FOR MANUFACTURING THE SAME, USE OF THE SAME DSM NV (NL) 2000-01-05 EP disclosed
EP-0877777-A1 REACTIVE SILICA PARTICLES, PROCESS FOR MANUFACTURING THE SAME, USE OF THE SAME DSM N.V. (NL) 1998-11-18 EP disclosed
EP-0867469-A2 Liquid curable resin composition DSM N.V. (NL) 1998-09-30 EP disclosed
EP-0867753-A1 Organic nonlinear optical material and nonlinear optical element using the same MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 1998-09-30 EP disclosed
WO-1998001479-A1 RADIATION CURABLE RESIN COMPOSITION FOR MOLDING BY POLYMERIZATION IN DIES DSM N.V. (NL) 1998-01-15 WO disclosed
WO-1997012942-A1 REACTIVE SILICA PARTICLES, PROCESS FOR MANUFACTURING THE SAME, USE OF THE SAME DSM N.V. (NL) 1997-04-10 WO disclosed