Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.58 |
| ▸ | CTSB | P07858 | 1/20 | 0.54 |
| ▸ | MAPT | P10636 | 2/20 | 0.54 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.54 |
| ▸ | AKR1C4 | P17516 | 2/20 | 0.53 |
| ▸ | AKR1C3 | P42330 | 2/20 | 0.53 |
| ▸ | AKR1C2 | P52895 | 2/20 | 0.53 |
| ▸ | AKR1C1 | Q04828 | 2/20 | 0.53 |
| ▸ | AR | P10275 | 1/20 | 0.53 |
| ▸ | PKM | P14618 | 2/20 | 0.52 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.51 |
| ▸ | HTT | P42858 | 2/20 | 0.51 |
| ▸ | PDE7A | Q13946 | 1/20 | 0.51 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.50 |
| ▸ | ALDH3A1 | P30838 | 1/20 | 0.47 |
| ▸ | MEN1 | O00255 | 1/20 | 0.46 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.45 |
| ▸ | HPGD | P15428 | 1/20 | 0.45 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11147829 | 0.90 | TDP1 (0.60) | RXFP1MAPTNPSR1PKMKMT2A | |
| 4-Nitroaniline SCHEMBL9483906 | 0.88 | RXFP1 (0.47) | RXFP1CTSBMAPTNPSR1AKR1C4 | |
| SCHEMBL5503917 | 0.87 | RXFP1 (0.49) | RXFP1CTSBMAPTNPSR1AKR1C4 | |
| SCHEMBL4583812 | 0.83 | HCAR3 (0.63) | CTSBMAPTNPSR1AKR1C4AKR1C3 | |
| SCHEMBL30735789 | 0.83 | HCAR3 (0.63) | CTSBMAPTNPSR1AKR1C4AKR1C3 | |
| SCHEMBL9054525 | 0.81 | RXFP1 (0.52) | RXFP1MAPTNPSR1AKR1C4AKR1C3 | |
| SCHEMBL6671791 | 0.81 | AKR1C4 (0.49) | CTSBNPSR1AKR1C4AKR1C3AKR1C2 | |
| SCHEMBL733777 | 0.81 | KMT2A (0.69) | MAPTNPSR1PKMKMT2AHTT | |
| SCHEMBL3814746 | 0.81 | TDP1 (0.55) | CTSBMAPTAKR1C4AKR1C3AKR1C2 | |
| SCHEMBL29740651 | 0.81 | KMT2A (0.69) | MAPTNPSR1PKMKMT2AHTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 424 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110501875-B | Photoresist composition, manufacturing method, substrate and display device | 合肥鑫晟光电科技有限公司 | 2023-05-16 | — | — | CN | claimed |
| US-11592742-B2 | Photoresist composition, its manufacturing method, and manufacturing methods of metal pattern and array substrate | HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD. (CN) | 2023-02-28 | — | — | US | claimed |
| US-11579525-B2 | Photoresist composition, pixel definition structure and manufacturing method thereof, and display panel | HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD. (CN) | 2023-02-14 | — | — | US | claimed |
| CN-110441989-B | Photoresist composition | 沧州信联化工有限公司 | 2022-08-23 | — | — | CN | claimed |
| US-11322561-B2 | Photoresist composition, pixel definition layer, display substrate and method for preparing the same, and display device | HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD. (CN) | 2022-05-03 | — | — | US | claimed |
| CN-108919605-B | Photoresist composition, pixel defining layer, preparation method and application thereof | 京东方科技集团股份有限公司 | 2021-12-21 | — | — | CN | claimed |
| CN-109100915-B | Photoresist composition, pixel definition structure, manufacturing method of pixel definition structure and display panel | 合肥鑫晟光电科技有限公司 | 2021-12-14 | — | — | CN | claimed |
| US-20210335929-A1 | DISPLAY SUBSTRATE, DISPLAY APPARATUS, METHOD OF FABRICATING DISPLAY SUBSTRATE, AND PIXEL DEFINITION MATERIAL FOR FORMING PIXEL DEFINITION LAYER OF DISPLAY SUBSTRATE | HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD. (CN) | 2021-10-28 | — | — | US | claimed |
| US-20210333710-A1 | Photoresist Composition, its Manufacturing Method, and Manufacturing Methods of Metal Pattern and Array Substrate | HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD. (CN) | 2021-10-28 | — | — | US | claimed |
| CN-111285796-B | Monomer, polymer, resin composition, substrate, preparation method and display device | 合肥鑫晟光电科技有限公司 | 2021-09-21 | — | — | CN | claimed |
| CN-108003273-A | PH response type polymers and preparation method thereof and photoetching compositions | 合肥鑫晟光电科技有限公司 | 2018-05-08 | — | — | CN | claimed |
| CN-102830589-B | Resin composition of negative photoresist and preparation method thereof | BOE TECHNOLOGY GROUP CO LTD | 2014-12-17 | — | — | CN | claimed |
| CN-102830589-A | Resin composition of negative photoresist and preparation method thereof | BOE TECHNOLOGY GROUP CO LTD | 2012-12-19 | — | — | CN | claimed |
| US-20070172600-A1 | Molecular bonding method and molecular bonding device | NATIONAL INSTITUTE OF INFORMATION AND COMMUNICATION TECHNOLOGY INCORPORATED (JP) | 2007-07-26 | — | — | US | claimed |
| US-20070114400-A1 | Probe | NATIONAL INSTITUTE OF INFORMATION AND COMMUNICATIONS TECHNOLOGY, INCORPORATED (JP) | 2007-05-24 | — | — | US | claimed |
| EP-1623953-A1 | PROBE | National Institute of Information and Communications Technology (JP) | 2006-02-08 | — | — | EP | claimed |
| EP-1621517-A1 | METHOD OF BONDING MOLECULE AND MOLECULE BONDING APPARATUS | National Institute of Information and Communications Technology (JP) | 2006-02-01 | — | — | EP | claimed |
| CN-1508625-A | Negative photoresist resin coating liquid and preparation method thereof | 中国科学院理化技术研究所 | 2004-06-30 | — | — | CN | claimed |
| US-4522913-A | DIACRYLATE OR LOW MOLECULAR WEIGHT OLIGOMER THEROF, POLYMERIC FILLER, AND SENSITTIZER | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 1985-06-11 | — | — | US | claimed |
| US-4321319-A | Photosensitive compositions containing polyamides acid with photosensitive groups | HITACHI, LTD. (JP) | 1982-03-23 | — | — | US | claimed |