Alcohol

Alcohol

SCHEMBL6463080

CCO.CCOCCC(=O)O

nearest known ligand 0.48

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

MMP1MMP13MMP7MMP8polrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of Alcohol. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.48
TSHR P16473 5/20 0.44
FFAR3 O14843 1/20 0.43
HDAC3 O15379 1/20 0.43
HDAC1 Q13547 1/20 0.43
HDAC2 Q92769 1/20 0.43
HDAC8 Q9BY41 1/20 0.43
THRB P10828 1/20 0.39
AKR1B1 P15121 1/20 0.39
LMNA P02545 2/20 0.38
ALKBH5 Q6P6C2 1/20 0.38
SUCNR1 Q9BXA5 1/20 0.38
EGLN1 Q9GZT9 1/20 0.38
GPR84 Q9NQS5 6/20 0.37
PPARG P37231 6/20 0.37
PPARD Q03181 6/20 0.37
PPARA Q07869 6/20 0.37
HDAC11 Q96DB2 5/20 0.37
TLR2 O60603 2/20 0.37
TDP1 Q9NUW8 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8665800 0.95 ALDH1A1 (0.48) ALDH1A1TSHRFFAR3HDAC3HDAC1
SCHEMBL27523 0.95
SCHEMBL27622958 0.92
SCHEMBL10548245 0.92
SCHEMBL28170432 0.92
Ammonia Solution, Strong SCHEMBL27732614 0.92
SCHEMBL5068629 0.92
Hydrochloric Acid SCHEMBL1371872 0.92
Ether SCHEMBL28411769 0.92 ALDH1A1 (0.46) ALDH1A1TSHRFFAR3HDAC3HDAC1
SCHEMBL5069424 0.92

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115933316-A Positive photoresist composition, positive photoresist and MEMS stressed element 广州微纳芯材料科技有限公司 2023-04-07 CN claimed
CN-115933316-A Positive photoresist composition, positive photoresist and MEMS stressed element 广州微纳芯材料科技有限公司 2023-04-07 CN disclosed
EP-1591501-A1 NONAROMATIC SOLVENT TYPE COATING RESIN COMPOSITION Mitsui Chemicals, Inc. (JP) 2005-11-02 EP disclosed