SCHEMBL6468435

SCHEMBL6468435

[AsH2]c1nc([AsH2])nc([AsH2])n1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5334543 0.78
SCHEMBL7670555 0.35
SCHEMBL8938709 0.35
SCHEMBL3223293 0.35
SCHEMBL11043754 0.35
Methane SCHEMBL23044967 0.35
SCHEMBL8741457 0.35
Methane SCHEMBL20506644 0.35
SCHEMBL10872309 0.35
SCHEMBL30312582 0.35

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1487917-A4 POLYACETAL RESIN COMPOSITION HAVING EXCELLENT WEAR RESISTANCE AND ABRUPTION-PREVENTING EFFECT KOREA ENG PLASTICS CO LTD (KR) 2005-04-13 EP disclosed
EP-1487917-A1 POLYACETAL RESIN COMPOSITION HAVING EXCELLENT WEAR RESISTANCE AND ABRUPTION-PREVENTING EFFECT Korea Engineering Plastics Co., Ltd (KR) 2004-12-22 EP disclosed
WO-2003070827-A1 POLYACETAL RESIN COMPOSITION HAVING EXCELLENT WEAR RESISTANCE AND ABRUPTION-PREVENTING EFFECT KOREA ENGINEERING PLASTICS CO., LTD. (KR) 2003-08-28 WO disclosed