SCHEMBL5334543

SCHEMBL5334543

Cc1nc([AsH2])nc([AsH2])n1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6468435 0.78
SCHEMBL14699732 0.58 L3MBTL1 (0.43)
SCHEMBL77166 0.56 LMNA (0.30)
SCHEMBL10344394 0.54
SCHEMBL664729 0.54
SCHEMBL1244318 0.54
SCHEMBL10908775 0.54
SCHEMBL2517676 0.54
SCHEMBL7977161 0.54
SCHEMBL13118116 0.54

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2012009639-A9 AQUEOUS CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2012-05-24 WO claimed
EP-1844367-A1 COMPOSITION USEFUL FOR REMOVAL OF POST-ETCH PHOTORESIST AND BOTTOM ANTI-REFLECTION COATINGS ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2007-10-17 EP claimed
WO-2006074316-A1 COMPOSITION USEFUL FOR REMOVAL OF POST-ETCH PHOTORESIST AND BOTTOM ANTI-REFLECTION COATINGS ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2006-07-13 WO claimed
WO-2006039299-A1 HALOGEN-FREE FLAME RETARDANT POLYESTER GENERAL ELECTRIC COMPANY (US) 2006-04-13 WO disclosed
EP-1613678-A1 NOVEL CHAIN EXTENDER USEFUL IN THE MANUFACTURE OF POLYURETHANES AND THE CORRESPONDING POLYURETHANES HUNTSMAN INTERNATIONAL LLC (US) 2006-01-11 EP disclosed
WO-2004090009-A1 NOVEL CHAIN EXTENDER USEFUL IN THE MANUFACTURE OF POLYURETHANES AND THE CORRESPONDING POLYURETHANES HUNTSMAN INTERNATIONAL LLC (US) 2004-10-21 WO disclosed