SCHEMBL6473449

SCHEMBL6473449

C=C(CCN1CC1)C(=O)O

nearest known ligand 0.42

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
GLA P06280 1/20 0.42
ALDH1A1 P00352 3/20 0.41
MAPT P10636 2/20 0.41
POLB P06746 1/20 0.41
HTR1A P08908 5/20 0.41
HTR7 P34969 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.40
CYP1A2 P05177 1/20 0.39
MAPK1 P28482 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
KMT2A Q03164 2/20 0.36
TBXAS1 P24557 1/20 0.36
PAOX Q6QHF9 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3834185 0.91 ALDH1A1 (0.54) GLAALDH1A1MAPTPOLBL3MBTL1
SCHEMBL5678574 0.89 ALDH1A1 (0.57) ALDH1A1MAPTPOLBL3MBTL1CYP1A2
SCHEMBL504157 0.86 SMN1; SMN2 (0.50) GLAALDH1A1HTR1AHTR7CYP1A2
SCHEMBL3636300 0.86 KDM4E (0.41) GLAALDH1A1MAPTPOLBSMN1; SMN2
SCHEMBL547366 0.86 GLA (0.63) GLAALDH1A1MAPTSMN1; SMN2KMT2A
SCHEMBL1285649 0.85 PAOX (0.48) ALDH1A1MAPTHTR1AHTR7CYP1A2
Hydrochloric Acid SCHEMBL11421103 0.84 GLA (0.67) GLAALDH1A1MAPTSMN1; SMN2KMT2A
SCHEMBL25773749 0.84 MAPT (0.43) ALDH1A1MAPTPOLBKMT2A
SCHEMBL10597081 0.83 PAOX (0.52) ALDH1A1MAPTHTR1AHTR7CYP1A2
SCHEMBL525069 0.83 PAOX (0.52) ALDH1A1MAPTHTR1AHTR7CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0138934-B1 ACRYLIC TELOMERS WITH PHOTOCROSSLINKABLE GRAFTS, SYNTHESIS THEREOF AND THEIR APPLICATIONS TO THE COATING OF METALS Société Anonyme dite: NORSOLOR (FR) 1989-03-15 EP claimed
US-6879026-B2 Surface protecting adhesive film for semiconductor wafer and processing method for semiconductor wafer using said adhesive film MITSUI CHEMICALS, INC. (JP) 2005-04-12 US disclosed
EP-1471393-A2 Toner for developing electrostatic images containing specified binder resin, process for preparing the same, developer for developing electrostatic images, and image forming method FUJI XEROX CO., LTD (JP) 2004-10-27 EP disclosed
US-20040191662-A1 Toner for developing electrostatic images containing specified binder resin, process for preparing the same,developer for developing electrostatic images, and image forming method FUJI XEROX CO., LTD. (JP) 2004-09-30 US disclosed
US-20030219960-A1 Surface protecting adhesive film for semiconductor wafer and processing method for semiconductor wafer using said adhesive film MITSUI CHEMICALS, INC. (JP) 2003-11-27 US disclosed
US-5499128-A Liquid crystal display device with acrylic polymer spacers and method of manufacturing the same KABUSHIKI KAISHA TOSHIBA (JP) 1996-03-12 US disclosed
US-5306739-A Protective coatings for electronics MLT/MICRO-LITE TECHNOLOGY CORPORATION (US) 1994-04-26 US disclosed
US-5180757-A Curable acrylate monomers with photoinitiators for printing inks and protective coatings MLT/MICRO-LITE TECHNOLOGY CORPORATION 1993-01-19 US disclosed
US-5134175-A Rapid curing high solids mixture of unsaturated prepolymers and monomers, photoinitiators, fillers, surfactants; for protective coatings, printing inks MLT/MICRO-LITE TECHNOLOGY CORPORATION 1992-07-28 US disclosed