⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1639669 | 0.94 | — | — | |
| SCHEMBL17250795 | 0.90 | — | — | |
| SCHEMBL5455998 | 0.89 | — | — | |
| SCHEMBL1639927 | 0.84 | — | — | |
| SCHEMBL17974607 | 0.84 | — | — | |
| SCHEMBL13397470 | 0.84 | — | — | |
| SCHEMBL10000287 | 0.82 | — | — | |
| SCHEMBL13169052 | 0.82 | — | — | |
| SCHEMBL628831 | 0.81 | — | — | |
| SCHEMBL14252142 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 173 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7446055-B2 | Aerosol misted deposition of low dielectric organosilicate films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-11-04 | — | — | US | claimed |
| US-20060211271-A1 | Aerosol misted deposition of low dielectric organosilicate films | VERSUM MATERIALS US, LLC | 2006-09-21 | — | — | US | claimed |
| EP-1520891-B1 | FILM FORMING COMPOSITION, PROCESS FOR PRODUCING FILM FORMING COMPOSITION, INSULATING FILM FORMING MATERIAL, PROCESS FOR FORMING FILM, AND SILICA-BASED FILM | JSR CORP (JP) | 2019-05-01 | — | — | EP | disclosed |
| EP-1391476-B1 | PHOTOREACTIVE COMPOSITION | SEKISUI CHEMICAL CO LTD (JP) | 2015-12-09 | — | — | EP | disclosed |
| US-8536242-B2 | Photocurable composition | SEKISUI CHEMICAL CO., LTD. (JP) | 2013-09-17 | — | — | US | disclosed |
| EP-1746122-B1 | METHOD FOR FORMING ORGANIC SILICA FILM, ORGANIC SILICA FILM, WIRING STRUCTURE AND SEMICONDUCTOR DEVICE | JSR CORP (JP) | 2013-06-12 | — | — | EP | disclosed |
| US-8450045-B2 | Pattern forming method | JSR CORPORATION (JP) | 2013-05-28 | — | — | US | disclosed |
| EP-1705207-B1 | METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM | JSR CORP (JP) | 2012-10-24 | — | — | EP | disclosed |
| US-8283260-B2 | Process for restoring dielectric properties | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-10-09 | — | — | US | disclosed |
| US-20120251785-A1 | AROMATIC POLYCARBONATE RESIN COMPOSITION | TEIJIN CHEMICALS, LTD. (JP) | 2012-10-04 | — | — | US | disclosed |
| US-8268403-B2 | Curing a coating of a siloxane compound and a carbosilane compound using ultraviolet radiation; a low relative dielectric constant, excellent chemical resistance, plasma resistance, mechanical strength | JSR CORPORATION (JP) | 2012-09-18 | — | — | US | disclosed |
| US-20010018129-A1 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2001-08-30 | — | — | US | disclosed |
| EP-1127929-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-08-29 | — | — | EP | disclosed |
| EP-1122770-A2 | Silica-based insulating film and its manufacture | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| US-20010009936-A1 | Method of manufacturing material for forming insulating film | JSR CORPORATION (JP) | 2001-07-26 | — | — | US | disclosed |
| EP-1117102-A2 | Method of manufacturing material for forming insulating film | JSR Corporation (JP) | 2001-07-18 | — | — | EP | disclosed |
| EP-1090967-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-11 | — | — | EP | disclosed |
| EP-1088868-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-04 | — | — | EP | disclosed |
| EP-1058274-A1 | Composition for film formation and material for insulating film formation | JSR Corporation (JP) | 2000-12-06 | — | — | EP | disclosed |
| EP-1045290-A2 | Composition for resist underlayer film and method for producing the same | JSR Corporation (JP) | 2000-10-18 | — | — | EP | disclosed |