SCHEMBL647844

SCHEMBL647844

[CH2]C([CH2])([CH2])C[O]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16968777 0.70
SCHEMBL6272124 0.70
SCHEMBL9937262 0.60
SCHEMBL1496745 0.59
SCHEMBL1496778 0.56
SCHEMBL15361 0.56
SCHEMBL9055 0.56
SCHEMBL16430165 0.56
SCHEMBL24965 0.56
SCHEMBL392621 0.54

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8119327-B2 Hard, cold flowable, photosensitive photoresist coatings; consistant flexibility; strippability; shelf life; prepolymers comprised of such as methyl methacrylate, benzyl methacrylate and glycidyl methacrylate; photocuring with diacrylate monomer or oligimer HUNTSMAN ADVANCED MATERIALS AMERICAS LLC (US) 2012-02-21 US disclosed
EP-1487888-B1 POLYMERISABLE COMPOSITION HUNTSMAN ADV MAT SWITZERLAND (CH) 2008-10-22 EP disclosed
US-20050170094-A1 Polymerisable composition HUNTSMAN ADVANCED MATERIALS AMERICAS INC 2005-08-04 US disclosed
EP-1487888-A2 POLYMERISABLE COMPOSITION Huntsman Advanced Materials (Switzerland) GmbH (CH) 2004-12-22 EP disclosed
WO-2003082937-A9 POLYMERISABLE COMPOSITION HUNTSMAN ADV MAT SWITZERLAND (CH) 2004-09-16 WO disclosed
WO-2003082937-A2 POLYMERISABLE COMPOSITION HUNTSMAN ADVANCED MATERIALS (SWITZERLAND) GMBH (CH) 2003-10-09 WO disclosed