Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL434280 | 0.80 | — | — | |
| Hydrochloric Acid SCHEMBL452476 | 0.76 | — | — | |
| Hydrochloric Acid SCHEMBL8648875 | 0.76 | — | — | |
| Hydrochloric Acid SCHEMBL272184 | 0.75 | — | — | |
| Hydrochloric Acid SCHEMBL7552329 | 0.75 | — | — | |
| Hydrochloric Acid SCHEMBL9217941 | 0.73 | — | — | |
| SCHEMBL2192964 | 0.71 | — | — | |
| Bromide SCHEMBL7884014 | 0.71 | — | — | |
| Hydrochloric Acid SCHEMBL7548388 | 0.71 | — | — | |
| Hydrochloric Acid SCHEMBL564750 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170170272-A1 | COINTEGRATION OF DIRECTED SELF ASSEMBLY AND SIDEWALL IMAGE TRANSFER PATTERNING FOR SUBLITHOGRAPHIC PATTERNING WITH IMPROVED DESIGN FLEXIBILITY | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2017-06-15 | — | — | US | claimed |
| US-20140357083-A1 | DIRECTED BLOCK COPOLYMER SELF-ASSEMBLY PATTERNS FOR ADVANCED PHOTOLITHOGRAPHY APPLICATIONS | APPLIED MATERIALS, INC. (US) | 2014-12-04 | — | — | US | claimed |
| US-9911603-B2 | Pattern decomposition for directed self assembly patterns templated by sidewall image transfer | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2018-03-06 | — | — | US | disclosed |
| US-9719170-B2 | Patterned block copolymer structure with oxide lines for line density multiplication | WESTERN DIGITAL TECHNOLOGIES, INC. (US) | 2017-08-01 | — | — | US | disclosed |
| US-20170170272-A1 | COINTEGRATION OF DIRECTED SELF ASSEMBLY AND SIDEWALL IMAGE TRANSFER PATTERNING FOR SUBLITHOGRAPHIC PATTERNING WITH IMPROVED DESIGN FLEXIBILITY | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2017-06-15 | — | — | US | disclosed |
| US-20170162380-A1 | PATTERN DECOMPOSITION FOR DIRECTED SELF ASSEMBLY PATTERNS TEMPLATED BY SIDEWALL IMAGE TRANSFER | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2017-06-08 | — | — | US | disclosed |
| US-9576817-B1 | Pattern decomposition for directed self assembly patterns templated by sidewall image transfer | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2017-02-21 | — | — | US | disclosed |
| US-20160342089-A1 | METHOD FOR DIRECTED SELF-ASSEMBLY (DSA) OF A BLOCK COPOLYMER (BCP) USING A TOPOGRAPHIC PATTERN | WESTERN DIGITAL TECHNOLOGIES, INC. | 2016-11-24 | — | — | US | disclosed |
| US-20160319427-A1 | PATTERNED BLOCK COPOLYMER STRUCTURE WITH OXIDE LINES FOR LINE DENSITY MULTIPLICATION | JPMORGAN CHASE BANK, N.A. | 2016-11-03 | — | — | US | disclosed |
| US-9466534-B1 | Cointegration of directed self assembly and sidewall image transfer patterning for sublithographic patterning with improved design flexibility | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2016-10-11 | — | — | US | disclosed |
| US-9458531-B2 | Method for directed self-assembly (DSA) of block copolymers using guiding line sidewalls | HGST Netherlands B.V. (NL) | 2016-10-04 | — | — | US | disclosed |
| US-8119017-B2 | Method using block copolymers for making a master mold with high bit-aspect-ratio for nanoimprinting patterned magnetic recording disks | HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V. (NL) | 2012-02-21 | — | — | US | disclosed |
| US-8059350-B2 | Patterned magnetic recording disk with patterned servo sectors having chevron servo patterns | HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V. (NL) | 2011-11-15 | — | — | US | disclosed |
| US-8048546-B2 | Perpendicular magnetic recording disk with ordered nucleation layer and method for making the disk | HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V. (NL) | 2011-11-01 | — | — | US | disclosed |
| US-20110235215-A1 | PATTERNED MAGNETIC RECORDING DISK WITH HIGH BIT-ASPECT-RATIO AND MASTER MOLD FOR NANOIMPRINTING THE DISK | JPMORGAN CHASE BANK, N.A. | 2011-09-29 | — | — | US | disclosed |
| US-7976715-B2 | Method using block copolymers for making a master mold with high bit-aspect-ratio for nanoimprinting patterned magnetic recording disks | HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V. (NL) | 2011-07-12 | — | — | US | disclosed |
| US-20110143169-A1 | PERPENDICULAR MAGNETIC RECORDING DISK WITH ORDERED NUCLEATION LAYER AND METHOD FOR MAKING THE DISK | HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V. (US) | 2011-06-16 | — | — | US | disclosed |
| US-20110096436-A1 | PATTERNED MAGNETIC RECORDING DISK WITH PATTERNED SERVO SECTORS AND METHOD USING BLOCK COPOLYMERS FOR MAKING A MASTER MOLD FOR NANOIMPRINTING THE DISK | HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V. (US) | 2011-04-28 | — | — | US | disclosed |
| US-20090311363-A1 | METHOD USING BLOCK COPOLYMERS FOR MAKING A MASTER MOLD WITH HIGH BIT-ASPECT-RATIO FOR NANOIMPRINTING PATTERNED MAGNETIC RECORDING DISKS | HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V. (US) | 2009-12-17 | — | — | US | disclosed |
| US-20090308837-A1 | METHOD USING BLOCK COPOLYMERS FOR MAKING A MASTER MOLD WITH HIGH BIT-ASPECT-RATIO FOR NANOIMPRINTING PATTERNED MAGNETIC RECORDING DISKS | HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V. (US) | 2009-12-17 | — | — | US | disclosed |