SCHEMBL648224

SCHEMBL648224

CCOC1(OCC)[Si](OCC)(OCC)CC[Si]1(OCC)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17822210 0.79
SCHEMBL27259201 0.67
SCHEMBL27583530 0.66
SCHEMBL28246783 0.66
Phosphine SCHEMBL27647373 0.66
Water SCHEMBL28192066 0.66
SCHEMBL22975126 0.65
Hydrochloric Acid SCHEMBL28098204 0.65
SCHEMBL27678806 0.65
Phosphine SCHEMBL27686828 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8119324-B2 Method of forming pattern, composition for forming upper-layer film, and composition for forming under-layer film JSR CORPORATION (JP) 2012-02-21 US disclosed
US-20090311622-A1 METHOD OF FORMING PATTERN, COMPOSITION FOR FORMING UPPER-LAYER FILM, AND COMPOSITION FOR FORMING UNDER-LAYER FILM JSR CORPORATION (JP) 2009-12-17 US disclosed