⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21113726 | 0.84 | — | — | |
| SCHEMBL27583530 | 0.66 | — | — | |
| SCHEMBL648224 | 0.65 | — | — | |
| SCHEMBL27259201 | 0.63 | — | — | |
| SCHEMBL14117141 | 0.61 | — | — | |
| SCHEMBL2862870 | 0.60 | — | — | |
| SCHEMBL21679565 | 0.59 | — | — | |
| SCHEMBL3956499 | 0.58 | — | — | |
| SCHEMBL15157466 | 0.56 | — | — | |
| SCHEMBL6053267 | 0.56 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20210050212-A1 | Low-K Dielectric Films | APPLIED MATERIALS, INC. (US) | 2021-02-18 | — | — | US | claimed |
| WO-2025217018-A1 | PRECURSOR, GAS MIXTURE, AND METHOD FOR DEPOSITING A LOW K DIELECTRIC FILM | APPLIED MATERIALS, INC. (US) | 2025-10-16 | — | — | WO | disclosed |
| US-20250313950-A1 | PRECURSOR, GAS MIXTURE, AND METHOD FOR DEPOSITING A LOW K DIELECTRIC FILM | APPLIED MATERIALS, INC. | 2025-10-09 | — | — | US | disclosed |
| US-20250293017-A1 | METHODS OF FORMING CONFORMAL SILICON OXYCARBONITRIDE THIN FILMS ON HIGH ASPECT RATIO SEMICONDUCTOR STRUCTURES | APPLIED MATERIALS, INC. (US) | 2025-09-18 | — | — | US | disclosed |
| US-11393678-B2 | Low-k dielectric films | APPLIED MATERIALS, INC. (US) | 2022-07-19 | — | — | US | disclosed |
| US-20210050212-A1 | Low-K Dielectric Films | APPLIED MATERIALS, INC. (US) | 2021-02-18 | — | — | US | disclosed |